“…The device was fabricated by step-by-step deposition of various functional layers. CuI , was used for the hole-transporting layer, and 3,6-di(9-carbazolyl)-9-(2-ethylhexyl)carbazole ( TCz1 ) was used for the electron-transporting layer. ,, TCz1 is characterized by good electron-injection properties, ,, and it was used as a host material for the FIrpic phosphor . The Ca layer topped with aluminum (Al) layer was used as the cathode.…”