2018
DOI: 10.1038/s41928-018-0118-9
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Electronic synapses made of layered two-dimensional materials

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Cited by 527 publications
(558 citation statements)
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References 48 publications
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“…A projected endurance of 10 years has been reported based on I-t curves collected at 85 °C in Pt/TaO x / Pt [129] and Pt/Al 2 O 3 /HfO 2 /Al 2 O 3 /TiN/Si. [135], the authors measured the relaxation time of Ti/h-BN/Au thresholdtype RS devices during more than 500 cycles, and the variability of the relaxation time observed was strikingly low (<10%, see Figure 6d). Studying the retention time of threshold-type RS devices is interesting in the field of neuromorphic computing, as they are suitable to emulate short-term plasticity learning rules because the retention time of the RS cell can be also interpreted as the relaxation time of an electronic synapse.…”
Section: State Retentionmentioning
confidence: 99%
“…A projected endurance of 10 years has been reported based on I-t curves collected at 85 °C in Pt/TaO x / Pt [129] and Pt/Al 2 O 3 /HfO 2 /Al 2 O 3 /TiN/Si. [135], the authors measured the relaxation time of Ti/h-BN/Au thresholdtype RS devices during more than 500 cycles, and the variability of the relaxation time observed was strikingly low (<10%, see Figure 6d). Studying the retention time of threshold-type RS devices is interesting in the field of neuromorphic computing, as they are suitable to emulate short-term plasticity learning rules because the retention time of the RS cell can be also interpreted as the relaxation time of an electronic synapse.…”
Section: State Retentionmentioning
confidence: 99%
“…Similar to the TMOs-based memristive devices, other ions migration, for example, B 3+ , N 3− and O 2− , in 2D layered materials have been proposed to account for the growth and rupture of filaments in vertical memristive devices; [57,60,80,109,112,113,129] It is well known that ions migration in conventional memristive devices causes the formation of filaments, while electricfield-induced S 2− migration in MoS 2 based planar structure memristive devices leads to the movement of grain boundaries and gives rise to resistive switching. Similar to the TMOs-based memristive devices, other ions migration, for example, B 3+ , N 3− and O 2− , in 2D layered materials have been proposed to account for the growth and rupture of filaments in vertical memristive devices; [57,60,80,109,112,113,129] It is well known that ions migration in conventional memristive devices causes the formation of filaments, while electricfield-induced S 2− migration in MoS 2 based planar structure memristive devices leads to the movement of grain boundaries and gives rise to resistive switching.…”
Section: Wwwadvelectronicmatdementioning
confidence: 99%
“…[60,86] However, it is different in Ag/WO 3 − x /WSe 2 /Gr vertical devices. In traditional TMOs-based synaptic devices, modulating the shape of LTP/LTD and realizing the transition between STP and LTP usually rely on the variation of the amplitudes and frequency of input voltage pulses.…”
Section: Wwwadvelectronicmatdementioning
confidence: 99%
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