2012
DOI: 10.1063/1.3685491
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Electronic transport in doped mixed-phase hydrogenated amorphous/nanocrystalline silicon thin films

Abstract: We report observations of three distinct conduction mechanisms in n-type doped mixed-phase amorphous/nanocrystalline silicon thin films over a range of nanocrystallite concentrations and temperatures. As the temperature is varied from 470 to 10 K, we observe activated conduction, multiphonon hopping (MPH), and Mott variable range hopping (VRH) as the nanocrystal content is increased. The transition from MPH to Mott-VRH hopping around 50 K is tentatively ascribed to the freeze out of the phonon modes.

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Cited by 21 publications
(17 citation statements)
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“…Specifically, as the average number ν of dopant electrons per NC is varied, the dependence of the resistivity ρ on the temperature T changes between Arrhenius-type activated conduction (γ = 1) and VRH (γ < 1). VRH has been reported in a variety of granular semiconductor systems [2,7,13,14], but thus far there is no general theory to explain how these different types of conduction can coexist and why they appear in particular ranges of the electron "filling factor" ν.…”
Section: Introductionmentioning
confidence: 99%
“…Specifically, as the average number ν of dopant electrons per NC is varied, the dependence of the resistivity ρ on the temperature T changes between Arrhenius-type activated conduction (γ = 1) and VRH (γ < 1). VRH has been reported in a variety of granular semiconductor systems [2,7,13,14], but thus far there is no general theory to explain how these different types of conduction can coexist and why they appear in particular ranges of the electron "filling factor" ν.…”
Section: Introductionmentioning
confidence: 99%
“…This is the well known "thermal equilibration effect" observed in doped a-Si:H [22,23]. The presence of the nanocrystallites has been found to lead to slower stretched exponential relaxation and a reduction in the difference in the conductivity between the slow cool and rapid quench states, consistent with slower hydrogen diffusion in the a/nc-Si:H films [24].…”
Section: N-type Doped A/nc-si:h Filmsmentioning
confidence: 81%
“…The conductivity as well as the photoconductivity of hydrogenated a-Si thin films containing nanocrystalline Si (nc-Si) inclusions is known to decrease when f is reduced (see Ref. [14][15][16][17][18] and references therein). The measured conductivities of the MQW cells obtained from the linear I-V curves in the 4th quadrant show the same trend: (4,17 ± 0:81) × 10 -7 (Ω cm) -1 for the 4 nm MQW device (f = 33 %) and (6:15 ± 0:63) × 10 -8 (Ω cm) -1 for the 4 nm MQW device (f = 11 %).…”
Section: Resultsmentioning
confidence: 99%