It has often been suggested that defects can enhance electron tunneling through barriers. Here, we derive a general expression of the current flowing through semiconductor barriers when induced by the presence of defects, taking into account tunneling and other possible mechanisms. Therefore, we calculate the capture probability of free electrons by defects located in the barrier and the subsequent emission probabilities of the captured electrons, by thermal emission or phononassisted tunneling into the barrier conduction band. The defect potential considered is composed of a d-function localized on first neighbors and of a Coulomb tail, thus allowing to treat all types of defects from shallow to deep ones. The result of the calculation is then compared with experiment. The temperature and electric field dependences of the current fit well the experimental data obtained for undoped GaAlAs barriers embedded in n GaAs, if the defect considered is the DX center. The concentration of these native donor defects that accounts for the amplitude of the current is, as expected, of the order of 10 16 cm À3 .