Electrophoretic deposition of hydroxyapatite Coating: A state of art

Pani, Rakesh; Behera, Rasmi Ranjan; Roy, Soma

doi:10.1016/j.matpr.2022.04.632

Cited by 8 publications

(6 citation statements)

References 69 publications

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“…The results indicated that the suspension for EPD was stable, and the HA particles were fully suspended in DMF. Unstable suspension tended to result in a non-homogeneous layer [21]. The layer thickness was approximately 40 μm for all the coatings.…”

Section: Resultsmentioning

confidence: 92%

“…The type of suspension greatly affects the quality of the coating. Stable suspension having suitably charged surface particles results in uniform distribution of particle deposition [21]. An EPD study [22] using nanopowder HA in DMF (dimethylformamide) suspension reported cracks in the HA layer deposited for 5 min at 30, 40, and 60 V. In comparison, a relatively free crack layer was obtained at 20 V. The DMF is a good solvent for HA with a wide range zeta potential value of 10-23 mV (for 1 g HA), depending on the pH [22].…”

Section: Introductionmentioning

confidence: 99%

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Optimizing parameter for electrophoretic deposition of hydroxyapatite coating with superior corrosion resistance on pure titanium

Rahmadani

Anawati

Gumelar³

et al. 2022

Mater. Res. Express

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Bioactive hydroxyapatite (HA) coating is applied on a commercially pure Ti by electrophoretic deposition (EPD). Optimizing the coating structure is necessary to obtain a stable layer and the best corrosion protection. The EPD was conducted at a constant voltage of 20, 30, and 40 V for 30 min in a HA/DMF (dimethylformamide) suspension. Uniform HA layers with a Ca/P ratio of 1.82 were successfully deposited on the Ti surface. The layers, which consisted of HA grains with the size of 1-5 μm, exhibited a gradual increase in thickness of 32, 50, and 60 μm with formation voltage. For the biomedical application, the suitable coating thickness was at least 50 μm. The high compaction of HA grains deposited at 30 V led to an order magnitude higher polarization resistance and ten times lower corrosion current density relative to the other specimens. The porous HA layer formed at 20 V, and the presence of cracks in the 40 V-coating led to a lower corrosion resistance relative to the 30-V coating. The 20 V- and 30 V-coatings remained intact and triggered the deposition of HA during immersion in simulated body fluid for 28 days, while the 40 V-coating dissolved into the solution. The optimum EPD voltage for depositing a stable HA coating with reasonable coating thickness and the best corrosion resistance was 30 V.

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Section: Resultsmentioning

confidence: 92%

Section: Introductionmentioning

confidence: 99%

Optimizing parameter for electrophoretic deposition of hydroxyapatite coating with superior corrosion resistance on pure titanium

Rahmadani

Anawati

Gumelar³

et al. 2022

Mater. Res. Express

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“…In addition, various modified and hybrid techniques have also been developed, including plasma-assisted EPD [400], and combinations of micro-arc oxidation (MAO) and EPD [401]. Additional information on the EPD of CaPO 4 is available in references [402,403].…”

Section: Electrophoretic Deposition (Epd)mentioning

confidence: 99%

There Are over 60 Ways to Produce Biocompatible Calcium Orthophosphate (CaPO4) Deposits on Various Substrates

Dorozhkin

2023

J. Compos. Sci.

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A The present overview describes various production techniques for biocompatible calcium orthophosphate (abbreviated as CaPO4) deposits (coatings, films and layers) on the surfaces of various types of substrates to impart the biocompatible properties for artificial bone grafts. Since, after being implanted, the grafts always interact with the surrounding biological tissues at the interfaces, their surface properties are considered critical to clinical success. Due to the limited number of materials that can be tolerated in vivo, a new specialty of surface engineering has been developed to desirably modify any unacceptable material surface characteristics while maintaining the useful bulk performance. In 1975, the development of this approach led to the emergence of a special class of artificial bone grafts, in which various mechanically stable (and thus suitable for load-bearing applications) implantable biomaterials and artificial devices were coated with CaPO4. Since then, more than 7500 papers have been published on this subject and more than 500 new publications are added annually. In this review, a comprehensive analysis of the available literature has been performed with the main goal of finding as many deposition techniques as possible and more than 60 methods (double that if all known modifications are counted) for producing CaPO4 deposits on various substrates have been systematically described. Thus, besides the introduction, general knowledge and terminology, this review consists of two unequal parts. The first (bigger) part is a comprehensive summary of the known CaPO4 deposition techniques both currently used and discontinued/underdeveloped ones with brief descriptions of their major physical and chemical principles coupled with the key process parameters (when possible) to inform readers of their existence and remind them of the unused ones. The second (smaller) part includes fleeting essays on the most important properties and current biomedical applications of the CaPO4 deposits with an indication of possible future developments.

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“…There are numerous deposition methods of hydroxyapatite coatings on metallic substrates, e.g., sol-gel, plasma spraying, RF magnetron sputter, pulse laser deposition, electrophoretic deposition, and electrolytic deposition [14,26]. The most popular technique is an electrophoretic deposition [1,[22][23][24][25][26][27][28]. The EPD technique has the following advantages: low cost of equipment, coating thickness control, simplicity of the process, capability of coating complex and uniform substrates, and small amount of time needed to obtain the coating [14,29].…”

Section: Introductionmentioning

confidence: 99%

Study of Nanohydroxyapatite Coatings Prepared by the Electrophoretic Deposition Method at Various Voltage and Time Parameters

Malisz,

Świeczko-Żurek,

Olive

et al. 2024

Materials

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The aim of the work is to compare the properties of nanohydroxyapatite coatings obtained using the electrophoretic deposition method (EDP) at 10 V, 20 V, and 30 V, and with deposit times of 2 and 5 min. The primary sedimentation was used to minimize the risk of the formation of particle agglomerates on the sample surface. Evaluation of the coating was performed by using a Scanning Electron Microscope (SEM), Energy-Dispersive Spectroscopy (EDS), Atomic Force Microscopy (AFM), optical profilometer, drop shape analyzer, and a nanoscratch tester. All of the coatings are homogeneous without any agglomerates. When low voltage (10 V) was used, the coatings were uniform and continuous regardless of the deposition time. The increase in voltage resulted in the formation of cracks in the coatings. The wettability test shows the hydrophilic behavior of the coatings and the mean contact angle values are in the range of 20–37°. The coatings showed excellent adhesion to the substrate. The application of a maximum force of 400 mN did not cause delamination in most coatings. It is concluded that the optimal coating for orthopedic implants (such as hip joint implants, knee joint implants or facial elements) is obtained at 10 V and 5 min because of its homogeneity, and a contact angle that promotes osseointegration and great adhesion to the substrate.

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Electrophoretic deposition of hydroxyapatite Coating: A state of art

Cited by 8 publications

References 69 publications

Optimizing parameter for electrophoretic deposition of hydroxyapatite coating with superior corrosion resistance on pure titanium

Optimizing parameter for electrophoretic deposition of hydroxyapatite coating with superior corrosion resistance on pure titanium

There Are over 60 Ways to Produce Biocompatible Calcium Orthophosphate (CaPO4) Deposits on Various Substrates

Study of Nanohydroxyapatite Coatings Prepared by the Electrophoretic Deposition Method at Various Voltage and Time Parameters

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