Electrostatic Field Distribution Measurement Using MEMS Micro-mirror Array

Kuriyama, T.; Takatsuji, Wataru; Itoh, Toshiya; Maeda, Hiroshi; Nakaie, Toshiyuki; Matsui, Jun; Miyamoto, Yoshiaki

doi:10.1541/ieejsmas.134.378

Cited by 2 publications

(4 citation statements)

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“…2D asymmetric silicon micro-mirrors were fabricated by SOI-MEMS process (11) ; a photograph of one of the resulting micro-mirrors is shown in Fig. 5 beam was cut with a picosecond-laser micromachining system (Japan Laser and Time-Bandwidth, Duettino-SHG).…”

Section: Vacuum-sealing Packagingmentioning

confidence: 99%

“…Electrostatic field distribution measurements Electrostatic field distribution measurement using a silicon micro-mirror array by SOI-MEMS processes has been reported (11) . Fig.…”

Section: 2mentioning

confidence: 99%

“…Microelectromechanical system (MEMS) scanning mirrors are used in laser projectors, laser scanners, collision-prevention sensors, wearable displays with retinal scan recognition, and electrostatic field distribution measurement (1)(2)(3)(4) . In the case of 2D silicon scanning micro-mirrors, the resonance frequencies in the low-and high-speed axes have been reported to exceed 500 Hz and 10,000 Hz, respectively (5) .…”

Section: Introductionmentioning

confidence: 99%

“…Electrostatic field distribution measurements using a silicon micro-mirror array fabricated by the MEMS process have been presented (11) . The deflection angle of each silicon micro-mirror, which was placed on a spherical surface and was deflected by an electrostatic field, was measured optically using a 2D optical scanner and position-sensitive detector (PSD).…”

Section: Introductionmentioning

confidence: 99%

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2D Asymmetric Silicon Micro-Mirrors for Electrostatic Field Distribution Measurement Using Optical Level Method

et al. 2015

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We developed silicon micro-mirrors with two asymmetric axes for electrostatic field distribution measurements using a single external piezoelectric ceramic vibrating element. The 2D asymmetric silicon micro-mirrors were fabricated by using an SOI-MEMS process. The vibration transmissibility of the proposed mirror under a vacuum atmosphere was evaluated by dynamic analysis. We obtained the resonant frequency in the low-speed axis of 23.3 Hz and in the high-speed axis of 556.8 Hz respectively. To prevent a reduction in the amplitude width, we induced a 90° phase shift between the low-and high-speed axes at the resonance frequency. The ratio of the deformation between the low-speed axis of 30 Hz and the high-speed axis of 604 Hz was simulated to be 4.04. In measurement, the ratio of the deformation between the low-speed axis of 23.3 Hz and the high-speed axis of 556.8 Hz was 6.48. The difference between the calculated and experiment values were apparently due to the fabrication errors and frequency characteristics of piezoelectric ceramic vibrating element. A Lissajous pattern projected onto the screen. The scanning angle was a degree of 7.6 (total angle) in the low-and high-speed axis. We subsequently measured the electrostatic field distribution using the 2D asymmetric silicon micro-mirrors by means of the optical level method.

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Section: Vacuum-sealing Packagingmentioning

confidence: 99%

“…Electrostatic field distribution measurements Electrostatic field distribution measurement using a silicon micro-mirror array by SOI-MEMS processes has been reported (11) . Fig.…”

Section: 2mentioning

confidence: 99%