Abstract:We report on AlGaN/GaN quantum point contacts fabricated by using e-beam lithography and dry ion etching. The tunable nano-constrictions are dened by the integration of side and top gates in a single device. In this conguration, the planar gates are located on the both sides of a quantum channel and the metallic top gates, which cover the active region, are separated from the substrate by an insulating and passivating layers of HfO2 or Al2O3/HfO2 composite. The properties of devices have been tested at T = 4.2… Show more
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