Elemental Mass Spectroscopy of Remote Surfaces from Laser-Induced Plasmas

Young, R. J. De; Situ, W.

doi:10.1366/0003702944027949

Cited by 22 publications

(11 citation statements)

References 7 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…It can be seen that when the laser is at normal incidence, the direction of the ejected material remains along the normal of the target surface. This is consistent with the previous experimental results and theories 10,11 .Also it appears that the amount of the ejected material (the dark plume near the target surface and within the interior of the shockwave front) decreases as the number of the ablation pulse increases. Laser pulse Fig.…”

Section: Pump Lasersupporting

confidence: 92%

Investigation of the dynamic process of high fluence femtosecond laser ablation of aluminum by ultrafast time-resolved shadowgraphy

Zhang

Liu

et al. 2008

SPIE Proceedings

View full text Add to dashboard Cite

The dynamic process of 800 nm high fluence femtosecond laser ablation of aluminum is revealed by ultrafast time-resolved shadowgraphs. Both single and multiple laser pulses at perpendicular or oblique incidence are employed in the experiment. It is demonstrated that femtosecond laser ablation of aluminum with a fluence of 40 J/cm 2 is a complex process involving both photothermal and photomechanical mechanisms. For a single ablation pulse, the propagation direction of the ejected material remains normal to the target surface regardless of the incidence angle of the laser. For the multiple pulses ablation with an oblique incidence angle, the propagation direction of the ejected material deviates from the normal of the target surface gradually as the number of ablation pulses increases due to the topographic change of the ablated region.

show abstract

Section: Pump Lasersupporting

confidence: 92%

Investigation of the dynamic process of high fluence femtosecond laser ablation of aluminum by ultrafast time-resolved shadowgraphy

Zhang

Liu

et al. 2008

SPIE Proceedings

View full text Add to dashboard Cite

show abstract

“…Several groups reported on plasma diagnostics to investigate the spatial distribution and temporal evolution of the plasma [11,12], plasma formation thresholds of various materials [13] and shape and size of plasma flare using bi-dimensional imaging techniques [14]. The investigation of the DP-LIBS of a semiconductor constitutes one of the most convenient and sensitive analytical techniques for qualitative and quantitative elemental investigations in a variety of applications such as industrial, defense, environmental, art and medical applications.…”

Section: Introductionmentioning

confidence: 99%

Chemical etching method assisted double-pulse LIBS for the analysis of silicon crystals

Khalil

2015

Appl. Phys. A

View full text Add to dashboard Cite

Two Nd:YAG lasers working in pulsed modes are combined in the same direction (collinear arrangement) to focus on silicon (Si) crystals in reduced oxygen atmosphere (0.1 mbar) for double-pulse laser-induced breakdown spectroscopy (DP-LIBS) system. Silicon crystals of (100) and (111) orientations were investigated, and Si samples were measured either without prior treatment (''untreated'') or after fabrication of nano-pores (''treated''). Nano-pores are produced by metal coating and by chemical etching. DP-LIBS spectra were compared for different Si samples (untreated, treated, (100) and (111) orientations), for double-pulse (DP) (with 266 nm pulse followed by 1064 nm pulse) excitation and for different delay times (times between the excitation laser pulse and the detection ICCD gate); treatment by chemical etching has been studied as well. The intensity of the atomic line Si I at 288.16 nm was enhanced by a factor of about three by using the DP-LIBS signals as compared to the single-pulse (SP) signal which could increase the sensitivity of the LIBS technique. This study proved that an optimized value of the etching time of Si during etching by chemical processes and short delay times are required. Plasma parameters [the electron temperature (T e ) and the electron number density (N e )] were calculated from measured SP-and DP-LIBS spectra. The most important result of this study is the much higher DP-LIBS intensity observed on Si (100) as compared to Si (111) for measurements under the same experimental conditions. This study could provide important reference data for the design and optimization of DP-LIBS systems involved in plasma-facing components diagnostics.

show abstract

“…Laser ionization mass spectrometry (LIMS)1), which uses laser-produced ions as a source for mass spectrometry, has been increasingly used for the characterization of materials, because of its advantages of microsampling and direct analysis of both conducting and non-conducting solids. [2][3][4][5][6][7][8][9][10][11] In LIMS, a time-of-flight mass analyzer has been the most popular mass analyzer, because it is an ideal mass analyzer for a pulsed ion source. From the practical viewpoint, a quadrupole mass filter is also attractive because of its small size.…”

Section: Introductionmentioning

confidence: 99%

Effect of Laser Energy on Ion Signal Intensity in a Quadrupole-based Laser Ionization Mass Spectrometer.

1999

View full text Add to dashboard Cite

Keywords: laser ionization mass spectrometry, quadrupole mass filter, ion intensity, laser energy, solid sample SynopsisThe effect of the laser energy on the ion signal intensity was studied with the use of a quadrupole-based laser ionization mass spectrometer by varying the laser pulse energy over a range of 2 to 24 mJ. The experiment showed increase of the ion signal intensity with the laser energy up to the peak at 8 mJ. Reconstruction of the ion chamber to introduce retarding electric field in it was found to be more effective to increase the ion signal intensity and signal to noise ratio.

show abstract

Elemental Mass Spectroscopy of Remote Surfaces from Laser-Induced Plasmas

Cited by 22 publications

References 7 publications

Investigation of the dynamic process of high fluence femtosecond laser ablation of aluminum by ultrafast time-resolved shadowgraphy

Investigation of the dynamic process of high fluence femtosecond laser ablation of aluminum by ultrafast time-resolved shadowgraphy

Chemical etching method assisted double-pulse LIBS for the analysis of silicon crystals

Effect of Laser Energy on Ion Signal Intensity in a Quadrupole-based Laser Ionization Mass Spectrometer.

Contact Info

Product

Resources

About