2016
DOI: 10.1038/nmat4626
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Elimination of charge carrier trapping in diluted semiconductors

Abstract: In 1962, Mark and Helfrich demonstrated that the current in a semiconductor containing traps is reduced by N/Nt(r), with N the amount of transport sites, Nt the amount of traps and r a number that depends on the trap energy distribution. For r > 1, the possibility opens that trapping effects can be nearly eliminated when N and Nt are simultaneously reduced. Solution-processed conjugated polymers are an excellent model system to test this hypothesis, because they can be easily diluted by blending them with a hi… Show more

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Cited by 151 publications
(197 citation statements)
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“…This, again, indicates the presence of trap-assisted Shockley–Read–Hall (SRH) recombination in both devices 29, 30 . The slope was decreased from 1.51( k B T/q ) to 1.23( k B T/q ) by using VTD process, suggesting reduced trap-assisted recombination in VTD-fabricated devices 28, 31 . We measured the TA decay of the two devices to investigate the carrier lifetime (Supplementary Fig.…”
Section: Resultsmentioning
confidence: 95%
“…This, again, indicates the presence of trap-assisted Shockley–Read–Hall (SRH) recombination in both devices 29, 30 . The slope was decreased from 1.51( k B T/q ) to 1.23( k B T/q ) by using VTD process, suggesting reduced trap-assisted recombination in VTD-fabricated devices 28, 31 . We measured the TA decay of the two devices to investigate the carrier lifetime (Supplementary Fig.…”
Section: Resultsmentioning
confidence: 95%
“…As summarized in Table 2, the hole mobility in binary blend films was comparable to or larger than that in neat films. [39][40][41] In these diluted blends, the charge transport was improved or comparable to that in neat films. As shown in Figure 7, trap filling region was observed from 0.1 to 1 V for both PTB7-Th and PDCBT neat films but not observed for the ternary blend film.…”
Section: Resultsmentioning
confidence: 87%
“…[13] Figure 2b shows both electron and hole current for a blend of PSF-TAD:PFO at 10:90 wt% ratio. The hole current in the blend is again trap-free space-charge limited, but now the electron current is higher than the hole current and has an identical voltage dependence, indicating that also the electron transport now shows trap-free SCLC behavior, with an electron mobility higher than the hole mobility.…”
Section: Resultsmentioning
confidence: 99%
“…In our earlier work on poly[2-methoxy-5-(2′-ethylhexyloxy)p-phenylene vinylene] (MEH-PPV) blended with poly(9-vinylcarbazole)(PVK) or PFO, addition of 90% of the wide band gap polymer (ten times dilution) was suffi cient to virtually eliminate trapping effects. [ 13 ] Figure 2 b shows both electron and hole current for a blend of PSF-TAD:PFO at 10:90 wt% ratio. The hole current in the blend is again trap-free space-charge limited, but www.MaterialsViews.com www.advelectronicmat.de (3 of 6) 1500406 wileyonlinelibrary.com now the electron current is higher than the hole current and has an identical voltage dependence, indicating that also the electron transport now shows trap-free SCLC behavior, with an electron mobility higher than the hole mobility.…”
Section: Resultsmentioning
confidence: 99%