Embossing of chalcogenide glasses: monomode rib optical waveguides in evaporated thin films

Lian, Zheng; Pan, Wenfeng; Furniss, David; Benson, T.M.; Seddon, Angela B.; Kohoutek, T.; Orava, Jiří; Wágner, T.

doi:10.1364/ol.34.001234

Cited by 60 publications

(61 citation statements)

References 13 publications

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“…such as in [6] describing imprinting of optical waveguide into As-Se film. The embossing temperature is typically at temperatures 10−30°C above T g for thin films, at a supercooled-liquid viscosity (η) of ~10 9 Pa.s (Fig.…”

Section: Resultsmentioning

confidence: 99%

“…The substrate material must have a T g greater than that of the thin film to withstand the imprinting pressure (i.e. to avoid viscous flow), and should have a thermal expansion coefficient similar to that of the film to avoid film cracking and delamination, such as are seen, for example, for a lowtemperature chalcogenide film of As-Se on a high-temperature Ge-As-Se bulk substrate [6]. This is not a problem for bulk glasses, which are in effect their own substrates.…”

Section: Resultsmentioning

confidence: 99%

“…NIL can be used with hard (quartz, silicon, metal, or tungsten carbide, etc.) molds, with which imprinting has been demonstrated for optical waveguides (4.5−6 μm wide and 2 μm high) into As 2 Se 3 film by using Si mold during hot embossing [6], submicrometer nano-cone arrays into Ge 15 As 15 Se 17 Te 53 bulk glass by using Si mold [7], sub-micrometerperiod wiregrid polarizer into Sb-Ge-Sn-S bulk glass by using SiC mold [8], micrometer-size anti-reflection surfaces at the ends of infra-red (IR) As 2 S 3 chalcogenide glass (ChG) fibers by using Ni mold [9], and sub-micrometer diffraction grating in Ge 20 As 20 Se 14 Te 46 bulk glasses by using Si, SiO 2 and Ni molds [10].…”

Section: Introductionmentioning

confidence: 99%

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Sub-micrometer soft lithography of a bulk chalcogenide glass

Kohoutek¹,

Orava²,

Greer³

et al. 2013

Opt. Express

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Abstract:We demonstrate, for the first time, time-and cost-effective replication of sub-micrometer features from a soft PDMS mold onto a bulk chalcogenide glass over a large surface area. A periodic array of submicrometer lines (diffraction grating) with period 625 nm, amplitude 45 nm and surface roughness 3 nm was imprinted onto the surface of the chalcogenide AsSe2 bulk glass at temperature 225°C, i.e. 5°C below the softening point of the glass. Sub-micrometer soft lithography into chalcogenide bulk glasses shows good reliability, reproducibility and promise for feasible fabrication of various dispersive optical elements, antireflection surfaces, 2D photonic structures and nano-structured surfaces for enhanced photonic properties and chemical sensing. References and links1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, "Nanoimprint lithography," J. Vac. Sci. Technol. B 14(6), 4129-4133 (1996). 2. Y. Xia and G. M. Whitesides, "Soft lithography," Angew. Chem. Int. Ed. 37(5), 550-575 (1998)

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Sub-micrometer soft lithography of a bulk chalcogenide glass

Kohoutek¹,

Orava²,

Greer³

et al. 2013

Opt. Express

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“…8 Others exploit the inherent photosensitivity of GLS to write features directly with UV lasers. 9 In similar glass sulfides, there have been demonstrations of more exotic techniques such as hot embossing, [10][11][12] or photodissolution of silver, 13,14 which also has the potential to increase radiative efficiency through the local field enhancement of metal nanoparticles. 15 …”

Section: Gallium Lanthanum Sulfide Glassesmentioning

confidence: 99%

Fabrication of photonic crystals in rare-earth doped chalcogenide glass films for enhanced upconversion

Pollard¹,

Knight²,

Parker³

et al. 2012

Optical Components and Materials IX

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Gallium lanthanum oxysulfide (GLSO) is a promising host material for observing strong upconversion emission from trivalent rare-earth ions such as erbium (Er 3+ ). Its attractive properties include high rare-earth solubility due to the lanthanum content of the glass former, a high refractive index (n = 2.2 at 550nm) for high radiative efficiency, and a low maximum phonon energy of approximately 425cm −1 . Photonic crystals meanwhile can provide controlled light extraction, and may be capable of suppressing unwanted IR emission from lower lying metastable states. Here, we describe the fabrication of photonic crystals in annealed films of Er 3+ -doped GLSO deposited by RF sputtering. The most intense visible upconversion emission is observed in films annealed at 550• C, close to the bulk glass transition temperature. Hexagonal lattice photonic crystals are subsequently milled into the films using a focused ion beam (FIB). The milling parameters are optimized to produce the most vertical sidewall profile.

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“…Micro-and nano-patterning of chalcogenide glass (or thin film) based optical devices then plays an important role for further enhancement of their functionalities and applications. Micro-patterning of chalcogenide glasses can be realized by numerous techniques such as traditional mask-based, multi photon or direct UV lithography [6][7][8], holography [9,10], nano imprint lithography employing hard or soft stamps [11][12][13], ink-printing [14] or laser writing [15][16][17][18]. Femtosecond direct laser writing (DLW) has been demonstrated as an effective tool for fabrication of chalcogenide 3D photonic crystals [16], under surface "buried" waveguides [17] or low loss 3D waveguides [18] in chalcogenide GLS glasses employing large photo-induced changes in the refractive index of the features inscribed using focused beam and high power density from a short pulse lasers.…”

Section: Introductionmentioning

confidence: 99%

Highly efficient relief diffraction gratings inscribed in a chalcogenide bulk glass by a femtosecond laser

et al. 2012

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Direct laser writing has been already demonstrated for the fabrication of under surface "buried" 3D mid-IR waveguides in chalcogenide glasses by employing a large photo-induced refractive index change in the features formed in the path of the focused beam from a short pulse laser. In this paper, we report on direct laser writing of relief diffraction gratings with periods of 6, 14 and 24 μm into the surface of Ge 15 Ga 3 Sb 12 S 70 chalcogenide glass by using a 800 nm Ti:saphire femtosecond pulse laser. The first order diffraction efficiency of the fabricated gratings was over 60 % at 650 nm. We have also fabricated a "composite" grating composed of three relief diffraction gratings inscribed in the same position, but with a mutual tilt. Composite grating provided complex multidirectional diffraction of the light in the accordance with geometrical arrangement and grating period of all the gratings inscribed. The fabrication was implemented on a computer controlled stage employing surface-to-beam alignment, laser power and raster pattern control. Pulse energies of 1.5, 3.0 and 4.5 μJ were used, resulting in channel widths of around 4, 5 and 6 μm, respectively, and depths up to 1.7 μm. We propose practical applications including surface relief diffraction micro-gratings at the ends of multimode chalcogenide optical waveguides or on the surfaces of bare core optical fibers used for chemical sensing.

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Embossing of chalcogenide glasses: monomode rib optical waveguides in evaporated thin films

Cited by 60 publications

References 13 publications

Sub-micrometer soft lithography of a bulk chalcogenide glass

Sub-micrometer soft lithography of a bulk chalcogenide glass

Fabrication of photonic crystals in rare-earth doped chalcogenide glass films for enhanced upconversion

Highly efficient relief diffraction gratings inscribed in a chalcogenide bulk glass by a femtosecond laser

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