2024
DOI: 10.1039/d4py00957f
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Emerging trends in the chemistry of polymeric resists for extreme ultraviolet lithography

Jie Cen,
Zhengyu Deng,
Shiyong Liu

Abstract: With the demand for increasingly smaller feature sizes, extreme ultraviolet (EUV) lithography has become the cutting-edge technology for fabricating highly miniaturized integrated circuits. However, the limited brightness of EUV light...

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