We have used conversion electron emission channeling to determine the lattice location of 167m Er (t 1/2 =2.28 s) in InP after 60 keV room temperature implantation of 167 Tm (t 1/2 =9.25 d) at a dose of 6.8×10 12 cm -2 . Following annealing at temperatures above the major recovery step of the implantation damage at 100-150°C, we observe around 75% of Er on substitutional In sites. A smaller fraction of Er (7%) is found on substitutional P sites, the remainder on random sites. Annealing the unprotected InP crystal at temperatures above 250°C in vacuum causes a decrease in the channeling effects. Introduction Erbium doped InP shows luminescence at a wavelength of 1.54 µm [1-9], which is an interesting feature for infrared optoelectronic devices. Incorporation of Er in InP has been reported from both ion implantation [1][2][3][4][5][6][7][8] and doping during growth by metalorganic vapour phase epitaxy (MOVPE) [9]. An interesting aspect of the InP:Er system is the fact that its electroluminescence (EL) intensity is thermally stable and only slightly quenched at room temperature. This is in contrast to, e.g., the photo-and electroluminescence of Er in Si, but also to the Er photoluminescence (PL) in InP itself [3,4]. In order to explain this behaviour, it has been suggested that Er can exist in different configurations in InP. The absence of pronounced EL quenching was attributed to Er atoms occupying sites where they can be effectively excited via direct electron impact. On the other hand, the PL should be mainly caused by Er centers which are excited less efficiently by electron-hole recombination processes [3,4]. In that respect it is interesting to study possible lattice sites of implanted Er in InP. Substitutional In sites have been considered theoretically and are assumed to be the most likely occupied lattice positions of rare earth atoms in the 3+ ionization state [10]. Among the various rare earth doped InP systems only the lattice site of implanted Yb has been investigated previously by direct lattice location methods. Using the Rutherford backscattering (RBS) channeling technique, a 50% reduction in the backscattering yield of Yb was observed along the <100> direction [5][6][7][8]. However, the investigation of the axial <100> channeling alone does not allow one to discriminate, for instance, substitutional from tetrahedral interstitial sites or provide sublattice sensitivity and hence is not sufficient to unambiguously derive the lattice location.In order to carry out detailed lattice location studies of implanted Er in InP, we have applied conversion electron emission channeling [11] from the short-lived isotope