Emission of xenon in the spectral range of 120 – 800 nm upon excitation by diffuse and spark discharges

Панченко, А. Н.; Белоплотов, Д. В.; Kozhevnikov, Vladimir Valentinovich; Ломаев, М. И.; Sorokin, Dmitriy; Тарасенко, В. Ф.

doi:10.1070/qel17548

Cited by 4 publications

(4 citation statements)

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“…Thus, short high-voltage pulses were applied to the gaps, providing a sharply inhomogeneous electric field near electrodes. With a high degree of probability, it can be concluded that in the above references, runaway electrons could appear and, similarly to [9][10][11][12][13][14], provide preionization and diffuse discharge formation.…”

Section: Hydrogen Lasermentioning

confidence: 94%

“…The VUV emission intensity in mixtures with Ar decreased due to the development of diffuse plasma inhomogeneities. The discharge contraction led to the appearance of continuum radiation in the visible region, associated with the recombination radiation of the spark leaders and channels [10].…”

Section: Hydrogen Lasermentioning

confidence: 99%

“…At high He pressures and F 2 concentrations in the mixture, see figure 10(a), the breakdown voltage increases [58], which leads to an increase in the electric field near the electrodes and in the gap, and also improves the rate of the current rise in the gap. In this case, as in [10], most of the incident wave of the voltage pulse is reflected from the gap, and the main discharge is formed after the arrival of the voltage wave, reflected from the generator.…”

Section: Vuv Fluorine Molecular Lasermentioning

confidence: 99%

“…It is known that quite uniform diffuse plasma can be produced without additional preionization in gaps formed by electrodes with a small radius of curvature [9][10][11][12]. When a high-voltage pulse with a short rise time is applied to electrodes providing a sharply non-uniform electric field in a gap, a diffuse discharge is formed in pressured gases due to breakdown initiation by runaway electrons and x-ray radiation.…”

Section: Introductionmentioning

confidence: 99%

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VUV lasing in diffuse discharges formed by runaway electrons

Panchenko,

Tarasenko,

Kozevnikov

2023

Laser Phys.

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The parameters of stimulated emission in diffuse discharges formed in a sharply inhomogeneous electric field by runaway electrons in mixtures of rare gases with the addition of H2 and F2 at pressures up to 10 atm are studied. Efficient VUV lasing was obtained at wavelengths from 148 to 193 nm on the transitions of H2, F2 and exciplex ArF* molecules. It was shown that the addition of He buffer gas increases the pulse duration, while Ne addition improves the output energy of the VUV laser on the H2 Lyman band. A laser pulse duration over 10 ns and an output of 0.12 mJ were obtained. The diffuse discharge in mixtures of He with F2 was found to form as a result of successive ionization waves. It was shown that the laser pulse at 157 nm has three peaks, which correspond to the maxima of the diffuse discharge current. Therewith, the first or second peak of the laser radiation has the maximum intensity, depending on the amplitude of the conduction current in the primary ionization wave. A maximal F2* laser electrical efficiency of η 0 = 0.18% and an output of Q 157 = 3.8 mJ were obtained in a He–F2 gas mixture at pressure of 10 atm, which exceeds the efficiency of lasers of this type pumped by transverse volume discharges with UV preionization. Long-pulse operation of the ArF* laser was achieved in a He–Ne–Ar–F2 gas mixture. Lasing at 193 nm continued during two periods of the diffuse discharge current. The total duration of the laser pulse was as long as 40 ns, and the radiation energy at 193 nm was as high as 2 mJ from an active volume of 20 cm3.

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