Emission properties of Ag/dielectric/Ag plasmonic thermal emitter with different lattice type, hole shape, and dielectric material

Abstract

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Emission Enhancement in Ag/${\rm SiO}_{2}$/Ag Thermal Emitter by Using a Hexagonal Dimple Array

“…3(a), the power emitted by the top Ag film was 13.5, 17.9 and 23.4 mW/cm 2 at 100, 150 and 200°C, respectively. These results are consistent with the fact that this structure is a gray body [7] According to Wein's displacement law (λT ) max power = 2897.8 μm·K, the maximum wavelength λ max is 6.1 μm at T = 473 K [7] (as indicated by the gray dashed line in Fig. 3(a)).…”

“…Figure 3(e) includes an extremely sharp thermal emission peak of ASA-PWT with a 15 nm-thick Ag-mirror and a 2000 nm-thick SiO 2 layer (FWHM = 0.22 μm for 160°C). This sharp peak arises from the sufficient thickness of the Agmirror and the low emitted power of a blackbody radiator in the spectral range of interest, respectively [7], [8].…”

“…For a hexagonal hole array with period a, the emission peak λ sp−Hex in the normal incidence can be approximately identified from the dispersion relation and momentum conservation law [1]- [7],…”

“…Of them the tri-layer Ag/SiO 2 /Ag plasmonic thermal emitter (ASA-PTE) has been demonstrated by Tsai et al [4] for its effectiveness for Bioinfrared light source. The emission optical properties of the ASA-PTE have been theoretically explained by approaches such as the momentum conservation law, dispersion relations of surface plasmon polaritons (SPPs) [1]- [3], SiO 2 thickness effect [5] surface plasmon type [6], lattice type [3], [7] and different dielectric materials on Si and sapphire substrates [7] as well. By extending the results of the above research, this work describes a novel Ag/SiO 2 /Ag structure to enhance the performance of ASA-PTE in areas such as a higher emission intensity and narrower FWHM.…”

Nanoscale Surface Plasmon All-Optical Diode Based on Plasmonic Slot Waveguides

“…Our calculations mean that the all-optical diode can be achieved even if the plasmonic slot waveguide possesses a certain range of disorder degrees in the depth or width of the plasmonic grating grooves. High-quality silver and silicon films can be fabricated very conveniently by a variety of thin-film growth techniques, such as the molecular-beam epitaxy method, the chemical vapor deposition method, and the magnetron sputtering method [29,30]. The asymmetric plasmonic grating can be fabricated by use of the microfabrication techniques, such as the focused ion-beam etching method, the electron-beam lithography method, and so on [31].…”