2003
DOI: 10.1116/1.1565153
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Energetic neutral fluxes towards surfaces in a magnetically enhanced reactive ion etch-like reactor

Abstract: In very large scale integrated microelectronics fabrication magnetically enhanced reactive ion etch (MERIE) reactors are established for many dry etch processes of conducting or dielectric materials. Angularly and energetically resolved distributions of the surfaces incident particles (ions and neutrals) as well as the fluxes of ions and neutrals play an essential role for feature scale profile evolution. The focus of this work is set on the calculation of the neutral to ion fluxes ratio. Therefore the MERIE r… Show more

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Cited by 3 publications
(2 citation statements)
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“…It remains to mention that the approach presented in this manuscript can be extended to RF modulated sheaths. Several investigations which have verified the presented ideas or used them for practical work are already completed [16][17][18][19][20][21][22][23][24], others -particularly in the field of microplasmas -are being conducted.…”
mentioning
confidence: 98%
“…It remains to mention that the approach presented in this manuscript can be extended to RF modulated sheaths. Several investigations which have verified the presented ideas or used them for practical work are already completed [16][17][18][19][20][21][22][23][24], others -particularly in the field of microplasmas -are being conducted.…”
mentioning
confidence: 98%
“…Kratzer et al have presented a hybrid model for the calculation of ion distribution functions behind a dc or RF driven plasma boundary sheath [41]. Sabisch et al have extended that model to calculate also the fluxes of energetic neutrals to exposed surfaces in the process of magnetically enhanced reactive ion etching (MERIE) [42]. Heil et al augmented the tool by a kinetic electron module and analysed the processes of Ohmic and stochastic heating in RF-CCPs [43,44].…”
Section: Discussionmentioning
confidence: 99%