Energy consumption and material fluxes in hard coating deposition processes

Gassner, Martina; Figueiredo, M. Rebelo de; Schalk, Nina; Franz, Robert; Weiß, Christian; Rudigier, H.; Holzschuh, H.; Bürgin, Werner; Pohler, Markus; Czettl, Christoph; Mitterer, Christian

doi:10.1016/j.surfcoat.2016.04.062

Cited by 24 publications

(7 citation statements)

References 11 publications

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“…The CVD process reveals a higher consumption compared to the PVD when considering all of the process steps. This has been demonstrated by several studies, such as sustainability assessments regarding manufacturing processes, energy consumption, and material flows in hard coating processes [65,66].…”

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confidence: 88%

“…Thus, it is possible to conclude that heating, etching, and refrigeration have a much lower contribution to energy consumption. Figure 4 compares the energy consumption for the PVD (using MS) and CVD during the deposition steps [65]. A global industrial concern is energy consumption to help reduce costs [64].…”

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confidence: 99%

“…A comparative study issued by Gassner et al [65], revealed a consumption of 112 kWh (process cycle time ≈ 5 h; coating thickness ≤ 6 µm) regarding the TiN deposition, using Magnetron Sputtering (MS) technique, which can be compared with the 974 kWh consumed in the TiCN/Al 2 O 3 deposition using CVD technique, (process cycle time: 18 h 30 min; coating thickness ≤ 30 µm). PVD process, particularly the sputtering process, does not require very high temperatures, such as the high-temperature that was usually developed in the CVD process.…”

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confidence: 99%

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Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

et al. 2018

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Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. Machining tools are, probably, one of the most common applications of this deposition technique, sometimes used together with chemical vapour deposition (CVD) in order to increase their lifespan, decreasing friction, and improving thermal properties. However, the CVD process is carried out at higher temperatures, inducing higher stresses in the coatings and substrate, being used essentially only when the required coating needs to be deposited using this process. In order to improve this technique, several studies have been carried out optimizing the PVD technique by increasing plasma ionization, decreasing dark areas (zones where there is no deposition into the reactor), improving targets use, enhancing atomic bombardment efficiency, or even increasing the deposition rate and optimizing the selection of gases. These studies reveal a huge potential in changing parameters to improve thin film quality, increasing as well the adhesion to the substrate. However, the process of improving energy efficiency regarding the industrial context has not been studied as deeply as required. This study aims to proceed to a review regarding the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand.

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Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

et al. 2018

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“…Recently, novel antimicrobial nanocomposites, e.g., based on halloysite nanotubes and Ag and ZnO nanoparticles [ 10 ], flax fibers with Ag and ZnO nanoparticles [ 11 ], or cellulose with Ag nanoparticles [ 12 ] have been suggested. A drawback of some of the used synthesis techniques is that they are based on the use of harmful and toxic chemicals [ 13 ], that they are not suitable to realize the required nanocomposite architecture necessary for multi-functional surfaces or that they are vacuum-based techniques resulting in high efforts and costs for production [ 14 ].…”

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confidence: 99%

Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition

et al. 2019

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Zn-doped and Cu-doped SiOx films were synthesized by atmospheric pressure plasma chemical vapor deposition to study their antibacterial efficiency against Gram-negative Escherichia coli and their cytotoxic effect on the growth of mouse cells. Zn-rich and Cu-rich particles with diameters up to several microns were found to be homogeneously distributed within the SiOx films. For both doping elements, bacteria are killed within the first three hours after exposure to the film surface. In contrast, mouse cells grow well on the surfaces of both film types, with a slight inhibition present only after the first day of exposure. The obtained results indicate that the films show a high potential for use as effective antibacterial surfaces for medical applications.

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“…Further concerning energy input on fabrication of thin films, PVD have higher efficiency in power consumption than CVD. In a study, Gassner et al (GASSNER et al, 2016) have stated that more than 40% of the energy consumed in a CVD typical process belongs to the heating ramp from room temperature to working conditions, while in PVD depositions the most energy demanding stage is the coating step itself, with roughly three quarters of the global energy consumption. These advantages justify the role of PVD as one of the main processes for coatings deposition nowadays.…”

Section: Deposition Techniquesmentioning

confidence: 99%

Manufacture and optimization of nanostructured Cr-Al-N coatings produced by reactive magnetron sputtering

Ávila¹,

Pinto²

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Energy consumption and material fluxes in hard coating deposition processes

Cited by 24 publications

References 11 publications

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition

Manufacture and optimization of nanostructured Cr-Al-N coatings produced by reactive magnetron sputtering

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