Energy flux measurements during magnetron sputter deposition processes

Thomann, Anne-Lise; Caillard, Amaël; Raza, Mohsin; Mokh, Mariem El; Cormier, Pierre‐Antoine; Konstantinidis, Stéphanos

doi:10.1016/j.surfcoat.2019.08.016

Cited by 39 publications

(22 citation statements)

References 66 publications

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“…Many groups have attempted to investigate the mechanism leading to the crystallization of amorphous NPs in weakly ionized, non thermal plasmas [48][49][50]. The plasma-particle interactions leading to the heating of the TiO2 NPs could be a suitable explanation to this phase transformation in O2 plasmas at low pressure.…”

Section: Chemical Analysis Of the Plasma-treated Nanostructured Tio2 mentioning

confidence: 99%

Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment

et al. 2020

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TiO2 nanoparticles (NPs) thin films with a thickness of 50 nm and a coreshell nanostructure were prepared using the spin coating technique and were treated using an inductively coupled O2 plasma at low pressure. While no significant features were observed during pumping, two kinetics can be identified during plasma processing using in situ spectroscopic ellipsometry. For very short plasma treatment times, the removal of solvent-based organic moieties surrounding TiO2 nanoparticles produces a densification of the inorganic TiO2 films. Such mineralization effect by the O2 plasma treatment was confirmed by X-ray photoelectron microscopy. For larger time scales, the average size of TiO2 NPs rises and significant changes of the optical properties occur. While no significant changes in the film nanostructure were observed by Scanning Electron Microscopy, a rise in the crystallite size and an increase in the agglomeration of TiO2 nanoparticles were confirmed by Transmission Electron Microscopy and Atomic Force Microscopy, respectively. The mechanisms involved in such plasma-induced modification of nanostructured TiO2 thin films are discussed in line with the energy fluxes of plasma-generated species.

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Section: Chemical Analysis Of the Plasma-treated Nanostructured Tio2 mentioning

confidence: 99%

Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment

et al. 2020

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“…Condensation enthalpy is released as atoms land on the surface and heat the substrate. Besides condensation, energy is also provided to the surface by other plasma species such as ions, electrons, (fast) neutrals, and photons whose fluxes may vary in accordance with the process conditions [ 42 ]. It should be mentioned that the surface of the sputter target, whose temperature is gradually increasing because of ion bombardment, emits IR photons.…”

Section: Reviewmentioning

confidence: 99%

“…Ultimately, in the case of a solid substrate, the heat transfer and resulting increase of surface temperature will influence the film growth mechanism and coating properties such as microstructure and phase constitution, as emphasized in [ 45 – 46 ]. Depending on the process conditions, energy flux values span from a few tens to thousands of milliwatts per square centimeter at the substrate position [ 42 , 47 ]. In the case of the SoL process, the abovementioned contributions may also impact the liquid temperature but also its physicochemical properties as plasma electrons, ions, and radiation may induce, for example, bond breaking in the liquid molecules.…”

Section: Reviewmentioning

confidence: 99%

“…Because all research groups carry out experiments in different vacuum chambers, it is extremely important to know the flux used to be able to compare the obtained results and to define normalized parameters to describe the interaction of the plasma with the surfaces. At the same time, it is necessary to know the parameters of the host liquid, not only the liquid composition and its physical properties but also its volume and the thickness of the liquid layer, to be able to estimate the concentration of sputter material in the resulting NP solution and to consider if the liquid surface is heated by the plasma [ 42 , 47 ].…”

Section: Reviewmentioning

confidence: 99%

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Sputtering onto liquids: a critical review

Sergievskaya¹,

Chauvin²,

Konstantinidis³

2022

Beilstein J. Nanotechnol.

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Sputter deposition of atoms onto liquid substrates aims at producing colloidal dispersions of small monodisperse ultrapure nanoparticles (NPs). Since sputtering onto liquids combines the advantages of the physical vapor deposition technique and classical colloidal synthesis, the review contains chapters explaining the basics of (magnetron) sputter deposition and the formation of NPs in solution. This review article covers more than 132 papers published on this topic from 1996 to September 2021 and aims at providing a critical analysis of most of the reported data; we will address the influence of the sputtering parameters (sputter power, current, voltage, sputter time, working gas pressure, and the type of sputtering plasma) and host liquid properties (composition, temperature, viscosity, and surface tension) on the NP formation as well as a detailed overview of the properties and applications of the produced NPs.

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“…) disappear in few ms and energy flux density quickly drops as shown on inset of Figure6b. The (3) energy contribution measured just before starting the experiment (plasma off and experiment at room temperature) is equal to 8.2 mW//cm² in this work performed at 1 Pa[57] and we assume that this value is unchanged during the experiment. After subtracting this low value, the energy flux density measured just after plasma extinction (1321 s) results from the addition of the (2) contribution corresponding to the eventual evaporated species and the (6) contribution corresponding to the IR radiation emitted by the heated target (all other vacuum parts are much colder).…”

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confidence: 99%

Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

Graillot-Vuillecot

Thomann

Lecas

et al. 2020

Vacuum

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Titanium-based thin films are synthesized by the magnetron sputtering of a titanium target in pure argon or in a mixture of argon and oxygen (reactive regime) in three experimental configurations: a hot target configuration for which the target is thermally disconnected from the cooled magnetron body, a cold/conventional target configuration, and a cold target configuration with an additional infrared source introduced in the chamber to understand the role of the radiation on thin film properties. In hot configuration, the target temperature and its emissivity are measured and compared to a 0D steady state model taking into account the main different cooling mechanisms. IR radiations constitute the major part of the total energy deposited on the substrate during hot target magnetron sputtering, whereas an increase of target temperature allows a rise of sputtered Ti and Ti + species fluxes and slightly affect their kinetic energy. In reactive regime, the obtained films are constituted of polycrystalline anatase TiO2, and an increase of target/IR source temperature leads to an improvement of crystallinity. In pure argon, hot configuration seems to enhance its porosity, induces columns exhibiting sharp-features, slightly modifies its crystalline properties and helps to decrease internal compressive stress.

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Energy flux measurements during magnetron sputter deposition processes

Cited by 39 publications

References 66 publications

Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment

Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment

Sputtering onto liquids: a critical review

Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

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