2021
DOI: 10.17516/1997-1397-2021-14-2-226-231
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Energy Gap Evaluation in Microcrystalline m-HfO2 Powder

Abstract: In this paper optical properties of microcrystalline HfO2 powder are investigated. X-ray diffraction and Raman spectroscopy were used to determine that the studied samples are in monoclinic phase. Based on the analysis of the diffuse reflectance spectra and applying Kubelka-Munk formalism we evaluated the indirect bandgap value Eg = 5.34 ± 0.05 eV. The calculated value is in agreement with independent data for HfO2 thin films synthesized by various methods. The paper is based on the materials of the report pre… Show more

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Cited by 3 publications
(2 citation statements)
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“…The authors claim that the indirect bandgap in amorphous as-grown films is 5.60 eV, which decreases as the annealing temperature grows, reaching 5.13 eV for thin films annealed at 600 • C with a monoclinic crystal structure. Nevertheless, the values obtained are reconciled with previous estimates of direct E g for amorphous and monoclinic hafnia in various structural modifications, such as nanopowder (in range of 5.5-5.8 eV) [7,25,39,40], thin films (5.3-5.8 eV) [41][42][43], bulk single crystal (5.89 eV) [44], etc.…”
Section: Estimation Of the Bandgap Widthsupporting
confidence: 84%
“…The authors claim that the indirect bandgap in amorphous as-grown films is 5.60 eV, which decreases as the annealing temperature grows, reaching 5.13 eV for thin films annealed at 600 • C with a monoclinic crystal structure. Nevertheless, the values obtained are reconciled with previous estimates of direct E g for amorphous and monoclinic hafnia in various structural modifications, such as nanopowder (in range of 5.5-5.8 eV) [7,25,39,40], thin films (5.3-5.8 eV) [41][42][43], bulk single crystal (5.89 eV) [44], etc.…”
Section: Estimation Of the Bandgap Widthsupporting
confidence: 84%
“…From the point of view of the experimental study of perfect simulation objects, only one work is today known for the authors to judge synthesized and investigated optical properties of monoclinic single crystal hafnium dioxide [13]. Meanwhile, commercial high-purity-degree powders (99.9%) are often used for analyzing physical and chemical properties [14][15][16]. Moreover, there are widespread methods to synthesize HfO 2 thin films supported on quartz and silicon substrates by atomic layer deposition and magnetron sputtering [9,[17][18][19][20][21].…”
Section: Introductionmentioning
confidence: 99%