Secondary ions mass-spectrometry and spreading resistance profiles in the layers of a ferromagnetic Si implanted with Mn has been studied. Czochralski Si wafers both n-and p-type, of high-and low-resistivity, as well as a float zone Si were implanted with impurity fluencies of (1 -5) x 10 16 cm -2 . The Mn impurity was found to compensate acceptors in a high-resistivity p-Si and donors in a low-resistivity n-Si. Only the small part of Mn ions in Si apparently incorporates into the Si crystal lattice, occupies the interstitial sites and the appropriate energy levels (Mn i ) -/0 and (Mn i ) +/++ equal to E c -0.12 eV for n-type Si and E v + 0.32 eV for p-type Si, respectively, are activated after vacuum annealing.