Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering

Mišina, M.; Shaginyan, L. R.; Maček, Marijan; Panjan, Peter

doi:10.1016/s0257-8972(01)01071-4

Cited by 55 publications

(33 citation statements)

References 7 publications

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“…Maxima of all the energy distributions in Fig. 5 correspond to thermalized ions produced at the plasma potential [27,37]. It is close to ground potential due to a strong unbalance of the used magnetron, prolonging a residence time of electrons in the discharge plasma.…”

Section: Magnetron With a Planar Targetmentioning

confidence: 85%

Pulsed dc Magnetron Discharges and their Utilization in Plasma Surface Engineering

Vlček

Musil

2004

Contrib. Plasma Phys.

121

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Fundamental aspects of magnetron operation in two types of practically interesting discharges, i.e. in highpower unipolar pulsed dc magnetron discharges for ionized high-rate sputtering and in asymmetric bipolar pulsed dc magnetron discharges for reactive sputtering, were investigated on the basis of time-resolved plasma diagnostics. We present the results obtained using time-resolved optical emission spectroscopy and time-and energy-resolved mass spectroscopy in high-power unipolar pulsed dc magnetron discharges at a repetition frequency of 1 kHz, an argon pressure of 1 Pa and an average target power loading in a pulse up to 500 W/cm 2 . The main aim was to study complex ionization mechanisms of sputtered Cu atoms and working gas (Ar) atoms, and to characterize energy distributions of Cu + and Ar + ions and their fractions in ion fluxes to a substrate during pulses. Some results achieved with a grooved target at the frequencies up to 50 kHz are discussed. We report also on the results obtained using energy-resolved mass spectroscopy and time-resolved Langmuir probe measurements in asymmetric bipolar pulsed dc magnetron discharges at repetition frequencies of 100 kHz and 350 kHz, an argon pressure of 0.53 Pa and a mean discharge power of 300 W. They explain a complex correlation between the pulsed plasma dynamics and the enhanced ion bombardment of growing films in these discharges. Some new development trends in the field of the dual pulsed dc magnetron sputtering are outlined.

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Section: Magnetron With a Planar Targetmentioning

confidence: 85%

Pulsed dc Magnetron Discharges and their Utilization in Plasma Surface Engineering

Vlček

Musil

2004

Contrib. Plasma Phys.

121

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“…The contribution from ions with somewhat higher energy (E > 10 eV) are detected for pulse energies of 12 J and above (forming a hump extending to 15 eV), however, they are by far less energetic than the Cr ions. These higher energy Ar + ions are thought to originate either from momentum transfer in collisions with sputtered species (followed by immediate ionization) or from Ar ions that after being accelerated towards the cathode got reflected as energetic neutrals to undergo post-ionization in the next stage [22,23]. It is worth to point out here that, apart from these high-energy ions that do not constitute a significant fraction of the total Ar + flux, the intensity of Ar + signal is independent of the pulse energy.…”

Section: Sputtering In Metallic Modementioning

confidence: 99%

Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N2 atmospheres

Greczyński

Hultman

2010

Vacuum

125

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“…In most cases Ar and the sputtered species from the target have been measured (see e.g., Refs. [10][11][12][13][14][15][16]. With the advent of high power impulse magnetron sputtering (HIPIMS) in the last years, especially for metals and oxides, also such high-energy density discharges have been investigated, partly also time-resolved.…”

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confidence: 99%

Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions

Welzel

Naumov

Ellmer

2011

Journal of Applied Physics

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Spectra of the ion mass and energy distributions of positive ions in reactive (Ar/O2) and nonreactive (Ar) dc magnetron sputtering discharges have been investigated by energy-resolved mass spectrometry. The results of three sputter target materials, i.e., Cu, In, and W are compared to each other. Besides the main gas constituents, mass spectra reveal a variety of molecular ions which are dependent on the target material. In reactive mode, ArO+ is always observed in Ar/O2 but molecules containing Ar and the metal were exclusively found for the Cu target. The occurrence of the different ions is explained in the context of their bond strengths obtained from density functional theory calculations. The energy spectra generally contain the known low-energy peak corresponding to the plasma potential. Differently extended high-energy tails due to sputtered material were observed for the different targets. Besides these, high-energetic ions were detected with up to several 100 eV. Their energies are significantly different for Ar+ and O+ with Ar+ strongly depending on the target material. The spectra are discussed together with results from transport of ions in matter (TRIM) calculation to elucidate the origin of these energetic ions.

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Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering

Cited by 55 publications

References 7 publications

Pulsed dc Magnetron Discharges and their Utilization in Plasma Surface Engineering

Pulsed dc Magnetron Discharges and their Utilization in Plasma Surface Engineering

Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N2 atmospheres

Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions

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