Laser-based femtosecond light sources in the infrared, visible, and the nearultraviolet spectral regime have been successfully employed for a large number of experimental studies of real-time dynamics of ultrafast surface processes, as is discussed at length in the preceding chapters. Visible and near-ultraviolet wavelengths, however, are capable of probing only a relatively restricted range of energies in the surface electronic structure -specifically electronic states within a few electron volts around the Fermi energy. Most of the surface-related time-resolved photoemission studies to date are, for instance, based on a two-photon photoemission process (the first (static) two-photon photoemission work was performed by Teich et al. [1]) and focus on the ultrafast dephasing and decay of electronic excitations in this optical energy range [2]. The use of femtosecond pulsed light sources in the extreme ultraviolet (XUV) 1) spectral region, in contrast, allows direct access to much more deeply bound electronic levels. Furthermore, the range of electron momentum that can be studied can be substantially expanded by the use of these light sources. Both aspects are highly attractive in the study of ultrafast processes since they provide new and relevant system information, for instance, on the chemical or magnetic state, or the structure, of a surface -information that is often not accessible in time-resolved experiments employing sources at lower photon energy.The first experimental work showing that ultrafast light sources in the XUV and soft X-ray region of the spectrum were possible were conducted in the late 1980s. Studies by McPherson et al. [3] and Ferray et al. [4] were the first to clearly show the 1) The extreme ultraviolet regime covers the wavelength between 50 and 1 nm (20-1200 eV).