2018
DOI: 10.1103/physrevapplied.10.064053
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Engineering Domain-Wall Motion in CoFeB/MgO Ultrathin Films with Perpendicular Anisotropy Using Patterned Substrates with Subnanometer Step Modulation

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Cited by 4 publications
(3 citation statements)
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“…[2,3] In this context, one of the most studied systems are Ta/ultrathin CoFeB/ MgO-based heterostructures, where the PMA is obtained via the CoFeB/MgO interface anisotropy. [4][5][6][7] The effective anisotropy constant K eff u , which ultimately determines the thermal stability of a memory cell, can be improved by engineering appropriate CoFeB-based heterostructures. On the other hand, these heterostructures become thermally unstable when lateral dimensions are scaled below 30 nm.…”
Section: Introductionmentioning
confidence: 99%
“…[2,3] In this context, one of the most studied systems are Ta/ultrathin CoFeB/ MgO-based heterostructures, where the PMA is obtained via the CoFeB/MgO interface anisotropy. [4][5][6][7] The effective anisotropy constant K eff u , which ultimately determines the thermal stability of a memory cell, can be improved by engineering appropriate CoFeB-based heterostructures. On the other hand, these heterostructures become thermally unstable when lateral dimensions are scaled below 30 nm.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, the nucleation of DWs at defects rather than DW pinning is observed in magnetic microwires. In contrast, in thin films, the efficient domain-wall pinning can be engineered by growing ultra-thin magnetic films with perpendicular anisotropy on a patterned substrate exhibiting sub-nanometer steps modulation [134]. The above-provided solutions, allow either annihilation of DWs nucleated on defects or the controlled nucleation of DWs on artificially created inhomogeneities.…”
mentioning
confidence: 99%
“…In Pt/Co/Pt films, for example, the values of H dep can be more than one order of magnitude higher 2,4,5 . Due to this low bulk pinning potential the DW dynamics can be easily controlled even in full films by artificial pinning imposed through homogeneous material engineering processes, like light ion irradiation [9][10][11] or pre-patterned substrates 12 . Defects generated through micro/nanostructuring can also have a great impact in pristine materials.…”
mentioning
confidence: 99%