Engineering Low‐Frequency Dielectric Function with Metamaterial Plasmonic Structures

Abstract

Metamaterial plasmonic composites offer remarkable flexibility in controlling effective dielectric properties of matter. These composites rely on trapped plasmonic resonances in metallic micro-or nano-structures. Such composites can have very large and/or small effective dielectric functions at various frequencies, depending on the composite design. In the electronics industry, there is a need for so-called high-k materials, which have large (and largely real, to minimize losses) low frequency dielectric function. In this Letter, metamaterial plasmonic composites with inductive elements are demonstrated to function as effective high-k materials, without heavy metal loading, confirming an earlier theoretical study. Moreover, embedding the high-k structures in dielectric or semiconducting matrices can address the parallel need for low leakage current devices.