NiO thin films grown on Si(100) substrates by electron beam evaporation, were sintered at 500 0 C and 700 0 C. The films were irradiated with 120 MeV Au 9+ ions. Irradiation had different effects depending upon the initial microstructure of the films. Irradiation of the films at a fluence of 3 × 10 11 ions cm -2 leads to grain growth for the films sintered at 500 0 C and grain fragmentation for the films sintered at 700 0 C. At still higher fluences of irradiation, grain size in 500 0 C sintered film decreased, but the same improved in 700 0 C sintered film. Associated with the grain size, texturing of the films was also shown to undergo significant modifications under irradiation.