2012
DOI: 10.1021/am300894u
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Engineering the Interface Characteristics of Ultrananocrystalline Diamond Films Grown on Au-Coated Si Substrates

Abstract: Enhanced electron field emission (EFE) properties have been observed for ultrananocrystalline diamond (UNCD) films grown on Au-coated Si (UNCD/Au-Si) substrates. The EFE properties of UNCD/Au-Si could be turned on at a low field of 8.9 V/μm, attaining EFE current density of 4.5 mA/cm(2) at an applied field of 10.5 V/μm, which is superior to that of UNCD films grown on Si (UNCD/Si) substrates with the same chemical vapor deposition process. Moreover, a significant difference in current-voltage curves from scann… Show more

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Cited by 33 publications
(38 citation statements)
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“…3(a). 41,42 In the present study, due to the formation of Au-Si eutectic interlayer, the active Si species, which diffused easily through the interfacial layer, are in atomic form and are very active. 33,34 The inset in Fig.…”
Section: Fig 2(a)) Is Shown Inmentioning
confidence: 62%
“…3(a). 41,42 In the present study, due to the formation of Au-Si eutectic interlayer, the active Si species, which diffused easily through the interfacial layer, are in atomic form and are very active. 33,34 The inset in Fig.…”
Section: Fig 2(a)) Is Shown Inmentioning
confidence: 62%
“…Thus, the existence of sp 2 at grain boundaries reduces the forbidden energy gap and increases the conductivity of the UNCD films. [15,16] The large surface area, excellent electrical properties, and effective surface passivation of the hybrid nanostructures in ZNRs/UNCD films make them an ideal structure for sensing applications.C omposite structures of ZNR and UNCD provide ah igh surface-to-volumer atio and al arge number of surfacet raps to facilitatet he sensing of hydrogen gas. UNCD films also help to increase the chargec arrier lifespan( referring to the electrons produced from the reaction of hydrogen gas and the adsorbed oxygen),w hich decreasest he carrier transit time.…”
Section: Introductionmentioning
confidence: 99%
“…The process of Au and Cr deposition on Si and the pre-seeding process for the growth of diamond on these Au(Si) substrates are described in detail elsewhere. 15,16 The UNCD films were first deposited using microwave plasma enhanced chemical vapor deposition (MPECVD) system in Ar(99%)/CH 4 (1%) plasma under 1200 W and 120 Torr for 90 min. The plane view scanning electron microscopy (SEM; Jeol 6500) image shown in Fig.…”
mentioning
confidence: 99%
“…2, which reveal the fascinating FEE properties of these films. The details of the FEE experiments are given elsewhere 15 and the FEE properties of these films were analyzed using the Fowler Nordheim (FN) theory. 29 The plots of ln(J/E 2 )-1/E (curve I, Fig.…”
mentioning
confidence: 99%
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