Enhanced effect of a plasma‐irradiated titanium substrate on the photocatalytic activity of a TiO₂ film

Abstract

To improve the photocatalytic activity of TiO 2 film, Ti substrates are irradiated by He ions with different incident ion energy, temperature, and fluence. Anatase TiO 2 films are then coated on the plasma-irradiated substrates via chemical vapor deposition followed by calcination. Photocurrent tests and photocatalytic oxidation (PCO) of formaldehyde are used to assess photocatalytic performance. The optimal plasmairradiated samples showed a four times higher photocurrent and a three fold increase in the rate constant of the PCO reaction compared to the TiO 2 coated, untreated control sample. It is found that the enhanced photocatalytic activity and photocurrent are related to the changes of Ti crystal structure and surface morphology through plasma irradiation. K E Y W O R D Sion bombardment, photocatalytic activity, plasma treatment, TiO 2 film, Ti substrate

Turning on the Photoelectrochemical Responses of Cd Probe-Deposited g-C3N4 Nanosheets by Nitrogen Plasma Treatment toward a Selective Sensor for H2S

“…To date, the modification strategies of nonmetallic doping have been widely applied for the fabrication of various photocatalysts to improve their photomotivated activities. − As the popular representative, the nitrogen (N) doping modification routes for photocatalysts are conventionally performed through high-temperature calcination typically using some nitrogenous organics as precursors. , However, the formidable agglomeration of nanomaterials during the calcination may take place to influence the catalysis activities of the catalysts. In recent years, the gas-derived plasma treatment technologies with some distinctive characteristics such as simple operation, rapid processing, and high efficiency have been applied alternatively for the modification or treatment of photocatalysts toward improved surface properties. , In particular, N 2 can be activated under plasma conditions to produce high-energy plasma (N + and N 2+ ) for doping N contents onto the nanomaterials. , Yet, the employment of the N 2 plasma pretreatment of g-C 3 N 4 nanosheets for the synergistic deposition of Cd probe toward the construction of photocatalytic heterojunctions has rarely been reported to date.…”

“…In recent years, the gas-derived plasma treatment technologies with some distinctive characteristics such as simple operation, rapid processing, and high efficiency have been applied alternatively for the modification or treatment of photocatalysts toward improved surface properties. 22,23 In particular, N 2 can be activated under plasma conditions to produce high-energy plasma (N + and N 2+ ) for doping N contents onto the nanomaterials. 24,25 Yet, the employment of the N 2 plasma pretreatment of g-C 3 N 4 nanosheets for the synergistic deposition of Cd probe toward the construction of photocatalytic heterojunctions has rarely been reported to date.…”