Enhanced Electron Field Emission Characteristics of Carbon Nanoflakes Prepared by Modified RF Sputtering

Abstract

Carbon films with flakelike geometry, exhibiting excellent electron field emission (EFE) properties were synthesized by a modified RF sputtering process, which used an Ar:CH 4 :H 2 gas mixture, instead of a conventional Ar:H 2 mixture. These films contain nanosized diamonds and allotropic phases (i-carbons and graphites) embedded in amorphous carbon films. The EFE process can be turned on at E 0 ¼ 4:83 V/mm, achieving an EFE current density of J e ¼ 280 mA/cm 2 at an 8 V/mm applied field. The EFE properties of these flakelike carbon films essentially do not change with processing parameters, indicating that these carbon films are more process-reliable and hence have better potential for application as electron field emitters.

Effects of Deposition Time Duration on Thermal Diffusivity of Hydrogenated Amorphous Carbon Films

“…1) The material is useful for many applications in electronics, tribology, medical devices, microelectromechanical actuators, and so on. [2][3][4] While there are several deposition techniques that can grow DLC films such as ion beam plating, magnetron sputtering, plasma enhanced chemical vapor deposition (PECVD), and vacuum arc deposition, [5][6][7][8] the material properties and film quality are sensitive to growth conditions. For example, a layer with a high quantity of sp 2 bonds can be produced from sputtering of a graphite target but it has low mechanical strength due to the low ion energies in the deposition process.…”