2023
DOI: 10.1021/acs.chemmater.3c02663
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Enhanced Growth in Atomic Layer Deposition of Ruthenium Metal: The Role of Surface Diffusion and Nucleation Sites

Amnon Rothman,
Andreas Werbrouck,
Stacey F. Bent

Abstract: Thermal atomic layer deposition (ALD) of metals on metal oxide surfaces is challenging due to nucleation delays caused by few chemisorption sites and poor material transport at the substrate. Here, we investigate ways to enhance the nucleation and growth of ruthenium (Ru) using ALD with the Ru(Cp) 2 precursor and O 2 as a coreactant. We explore the effects of functionalizing the substrate surface with small organometallic molecules, such as trimethylaluminum and diethylzinc, on the nucleation and growth of Ru … Show more

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Cited by 5 publications
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