The influence of Ag doping on the transport properties of Y 1 Ba 2 Cu 3 O 7Ϫx thin films prepared by Y, BaF 2 , and Cu co-evaporation and optimized ex situ post annealing has been investigated. Both undoped and Ag doped films have values of T c above 90 K, but J c ͑77 K͒ is highly dependent on the nominal thickness ͑t nom ͒ of the as-deposited film. For undoped films with t nom р300 nm J c ͑77 K͒ ͑ӷ10 6 A/cm 2 ͒ decreases monotonically with increasing film thickness. Above 300 nm J c ͑77 K͒ decreases rapidly to values below 5ϫ10 5 A/cm 2 . Ag doped films with t nom у200 nm have higher J c ͑77 K͒ values than those of undoped films. Ag doped films have a maximum in J c ͑77 K͒ around 250 nm. As for the undoped films, there is a large decrease in J c ͑77 K͒ for Ag doped films with t nom у300 nm. It was found that the higher values of J c ͑77 K͒ for the Ag doped films were due to a better epitaxial growth of the YBCO compound. The low values of J c ͑77 K͒ for both undoped and Ag doped single layer films with t nom у300 nm were found to be due to the absence of 1-2-4 inclusions in these films. Based on these findings high J c ͑77 K͒ films with t nom Ͼ300 nm were grown by successive deposition and annealing of films with t nom Ͻ300 nm on top of each other. A 2ϫ150 nm undoped film was found to have a J c ͑77 K͒ value of 4, 1ϫ10 6 A/cm 2 . This is almost a doubling of the J c ͑77 K͒ value as compared to the value for the 300 nm single layer undoped film ͑2,2ϫ10 6 A/cm 2 ͒. Ag doped double layer films of 2ϫ150 nm and 2ϫ215 nm had comparable J c ͑77 K͒ values ͑5,8ϫ10 6 and 5,6ϫ10 6 A/cm 2 , respectively͒. In comparison with the undoped 2ϫ150 nm film J c ͑77 K͒ is thus further increased ͑by about 50%͒ when doping with Ag.