“…By reducing the defect density in the perovskite layer, controlling strain and crystal phase, and improving crystalline order, electronic properties can be enhanced and quantum devices can be developed. Indeed, the ability to exploit epitaxy and epitaxial strain in silicon (Si) and III-V semiconductors revolutionized modern computing and optoelectronics and led to improved photovoltaics ( Bertness et al., 1994 ; Dai et al., 2015 ; King et al., 2007 ; Lee et al., 2012a ; Takamoto et al., 1997 ), LEDs ( Ghosh et al., 1986 ; Huang et al., 1992 ; Kuo et al., 2010 ; Peng and Wu, 2004 ), as well as 2DESs with ultra-high carrier mobility ( Dingle et al., 1978 ; Hatke et al., 2017 ; Manfra, 2014 ; Pfeiffer et al., 1989 ; Umansky et al., 2009 ). For example, strained Si is now commonly found in every MOSFET ( Sun et al., 2007 ) due to the increased interatomic distance in the silicon layer that nearly doubles the mobility.…”