Monolayer (ML) MoSe2 and WSe2 are
promising
materials for novel two-dimensional high-performance electronic and
optoelectronic devices. Although ML MoSe2 and WSe2 possess the same crystal structure and similar chemical composition
and band gap, they are experimentally observed to have distinct carrier
types in conduction, i.e., ML MoSe2 is usually a n-type and ML WSe2 usually a p-type semiconductor. The reasons for such distinction are not fully
understood so far. In this paper, by first-principles systematic investigation
of the properties of intrinsic point defects and some inevitable unintentional
extrinsic impurities under normal growth environments for ML MoSe2 and WSe2, we find that intrinsic defects are neither
efficient p-type nor n-type dopants
in these materials. Instead, hydrogen interstitial (H
i
inside
) is a shallow donor in both ML MoSe2 and WSe2, while nitrogen-substituting host selenium
(N
Se
) is a relatively
shallow acceptor in both ML MoSe2 and WSe2.
However, in the presence of both H and N doping, the compensation
between the two type dopants pinned the Fermi energy close to the
conduction band edge for ML MoSe2 and close to the valence
band edge for ML WSe2. Our study, therefore, provides insights
into the origin of the distinct types of conduction of ML MoSe2 and WSe2 and provides guidelines on how to dope
transition metal dichalcogenides.