2021
DOI: 10.1016/j.optmat.2021.111579
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Enhanced photoelectric performance of GaN-based Micro-LEDs by ion implantation

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Cited by 10 publications
(5 citation statements)
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“…94 Furthermore, a nitrogen ion implantation process has been adopted to modify sidewall surface defects. 96 The PL intensity of InGaN-based green lLEDs 94 Copyright 2022 IOP Publishing.…”
Section: Effective Passivation Of Sidewall Surfacementioning
confidence: 99%
“…94 Furthermore, a nitrogen ion implantation process has been adopted to modify sidewall surface defects. 96 The PL intensity of InGaN-based green lLEDs 94 Copyright 2022 IOP Publishing.…”
Section: Effective Passivation Of Sidewall Surfacementioning
confidence: 99%
“…QCSE also causes wavelength shift and efficiency drop with increasing injection current density. The applications of the semipolar (20)(21) and (20-2-1) epitaxial structures have been proven to effectively suppress the effects of QCSE [46]. Semipolar devices enable higher modulation bandwidths due to weak polarization fields and flat energy gap distributions, which lead to larger electron-hole wavefunction overlap reducing carrier lifetimes [47].…”
Section: Vlc Applications With Qd-based Color-conversion μLedsmentioning
confidence: 99%
“…Different types of ions have been employed to enhance specific applications. Argon ion implantation has been utilized to create a nano-air void structure on both GaN layers and sapphire substrates. , Fluorine ions have been employed to induce a high density of free holes in the near-surface layer of GaN, proving beneficial for micro-LED applications by isolating the emitting area and improving electronic properties. , N ion implantations have found applications in transferring GaAs into a GaN nanolayer, epitaxial lateral overgrowth processes, current block layer formation, and GaN sidewall treatment . Ion sources such as Co, Fe, Ni, and O have been utilized to investigate their implantation defect profiles in GaN. , Ion implantation processes have also been employed in resonant-cavity LEDs (RC-LEDs) and vertical-cavity surface-emitting lasers (VCSELs).…”
Section: Introductionmentioning
confidence: 99%
“…9,10 N ion implantations have found applications in transferring GaAs into a GaN nanolayer, 11 epitaxial lateral overgrowth processes, 12 current block layer formation, 13 and GaN sidewall treatment. 14 Ion sources such as Co, Fe, Ni, and O have been utilized to investigate their implantation defect profiles in GaN. 15,16 Ion implantation processes have also been employed in resonant-cavity LEDs (RC-LEDs) and verticalcavity surface-emitting lasers (VCSELs).…”
Section: Introductionmentioning
confidence: 99%