2014
DOI: 10.1039/c4ee00379a
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Enhanced stability of cobalt catalysts by atomic layer deposition for aqueous-phase reactions

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Cited by 115 publications
(129 citation statements)
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“…[36] The analogous Al 2 O 3 / Co/γ-Al 2 O 3 was inactive for the APH of furfural due to the formation of cobalt aluminate after calcination treatment, which was unreducible up to 800°C. Hence, the authors investigated the performances of TiO 2 /Co/TiO 2 prepared by ALD from TiCl 4 on TiO 2 -supported Co particles.…”
Section: Irreversible Deactivation Via Sintering And/or Leaching Of Smentioning
confidence: 99%
“…[36] The analogous Al 2 O 3 / Co/γ-Al 2 O 3 was inactive for the APH of furfural due to the formation of cobalt aluminate after calcination treatment, which was unreducible up to 800°C. Hence, the authors investigated the performances of TiO 2 /Co/TiO 2 prepared by ALD from TiCl 4 on TiO 2 -supported Co particles.…”
Section: Irreversible Deactivation Via Sintering And/or Leaching Of Smentioning
confidence: 99%
“…However, the alternated manual precursor addition for each half layer limited the control on the overcoat deposition and no effects on catalytic properties were reported. Similarly, ALD was used to deposit TiO 2 films over Co/TiO 2 catalysts to prevent sintering and leaching of cobalt nanoparticles [31]. However, no selectivity or reactivity effects were demonstrated beyond reduced deactivation.…”
Section: Introductionmentioning
confidence: 99%
“…Although there are not many choices for post-incorporation of catalytically active nanoparticles into already formed mesoporous support materials, one possibility enabling this process is atomic layer deposition (ALD). Over the last few decades, research groups have shown that ALD can be used to incorporate transition metal and metal oxide nanoparticles into mesoporous media with a penetration depth of several micrometers, i.e., not only pores on the outermost surface can be decorated with catalytically active nanoparticles, but also in deeper parts of mesoporous supporting materials [1][2][3]6,[21][22][23][24][25][26][27][28][29][30][31][32][33]. In ALD, an inorganic precursor is inserted into the reactor with the substrate, and then un-adsorbed or physisorbed precursors are purged, followed by insertion of secondary reagents.…”
Section: Introductionmentioning
confidence: 99%