A comprehensive study of the evolution of electronic structure and chemical bonding in disordered Ti 1−x Al x N and Ti 1−x−y Al x Ta y N systems was performed by means of ab initio density functional theory calculations using crystal orbital Hamilton population technique. Progressive changes in the character of interatomic chemical bonding were revealed when sequentially alloyed TiN with Al and Ta. Alloying TiN with Al leads to the change in the Ti-N bonding character from ionic to covalent, whereas Al-N bonds being strongly ionic. The following alloying of Ti 1−x Al x N solid solutions with Ta results in a significant reduction of the ionicity of the Al-N bonds, while retaining the covalency of the Ti-N bonds. In addition, alloying with Ta introduces metallic character of chemical bonding in Ti 1−x−y Al x Ta y N, with the degree of metallicity increasing with growing Ta concentration. The gain in metallicity was found to be provided not only by Ta-Ta bonds, which make the main contribution, but also by Ta-N bonds, which have covalent-metallic character. A strong dependence of bonding energies in Ti 1−x Al x N and Ti 1−x−y Al x Ta y N on local atomic surrounding was found. * To whom correspondence should be addressedTitanium nitride (TiN) is currently used as a structural and functional material in a variety of applications because of its unique properties. 1,2 First of all, TiN has high hardness, wear and corrosion resistance as well as high thermal stability, which are of crucial importance for protective and decorative coatings. 3,4 In addition, it is characterized by good diffusion barrier properties, low electrical resistivity, increased optical reflectance 5,6 and compatibility with complementary metal-oxide-semiconductor (CMOS) processes, that makes it promising for diffusion barrier and gate applications, 7 solar cell 8 and infrared reflector 9,10 applications as well as a coating for electrode materials in lithium-ion batteries. [11][12][13] Recently, TiN thin films were also suggested as alternative plasmonic material, 14-18 exhibiting less loss and providing other practical advantages compared to noble metals. However, easy oxidation of TiN already at temperatures of 500-550 • C, and its inherent brittleness restrict the field of its possible application in extreme thermal and mechanical conditions. 19,20 An effective method of increasing TiN oxidation resistance is its alloying with aluminum. Since aluminum (as titanium) can form an fcc crystal phase, 21 it substitutes for titanium in the crystal lattice of the nitride. The addition of Al to TiN coatings drastically increases their resistance to oxidation (from 500 • C to 800 • C), and also ensures the preservation of high values of hardness and wear resistance at temperatures up to 900-950 • C. [22][23][24] Moreover, due to their variable optical properties TiAlN-based coatings are very promising for photothermal and solar energy applications. 25,26 However, the necessity to enhance the efficiency of photothermal conversion of concentrating solar ...