2015
DOI: 10.1016/j.matlet.2015.01.012
|View full text |Cite
|
Sign up to set email alerts
|

Enhanced tunable properties of Bi1.5MgNb1.5O7 thin films grown on Pt–Si substrates using amorphous TiOx buffer layers

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2018
2018
2022
2022

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 11 publications
(2 citation statements)
references
References 13 publications
0
2
0
Order By: Relevance
“…The later strategy involves the second phase recombination, which mainly lowers the dielectric loss, and this strategy often consists the low loss oxides of magnesium and aluminum MgO, Al 2 O 3 , MgAl 2 O 4 , etc. In addition to these strategies, buffer and/or seed layer emplanting [5][6][7][8], thickness optimizing [9][10][11], and defect mitigating via atomic engineering [12] are also developed as strain modifying strategies to improve the dielectric tunable properties.…”
Section: Introductionmentioning
confidence: 99%
“…The later strategy involves the second phase recombination, which mainly lowers the dielectric loss, and this strategy often consists the low loss oxides of magnesium and aluminum MgO, Al 2 O 3 , MgAl 2 O 4 , etc. In addition to these strategies, buffer and/or seed layer emplanting [5][6][7][8], thickness optimizing [9][10][11], and defect mitigating via atomic engineering [12] are also developed as strain modifying strategies to improve the dielectric tunable properties.…”
Section: Introductionmentioning
confidence: 99%
“…Low-loss, high-k and dielectric tunable materials have attracted much attention for their huge potential in potable communication device application. [1][2][3][4][5][6][7][8] In these kinds of materials, barium strontium titanate (Ba x Sr 1−x TiO 3 ,BST) has been intensively studied for many years as dielectric tunable thin film materials. BST thin films have a high dielectric constant and large tunability.…”
Section: Introductionmentioning
confidence: 99%