2009
DOI: 10.1143/jjap.48.04c105
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Enhanced Two-Photon Absorption in a GaAs/AlAs Multilayer Cavity

Abstract: A strong enhancement of two-photon absorption (TPA) has been demonstrated in a 30-period GaAs/AlAs multilayer with a GaAs halfwavelength (/2) cavity layer. In order to measure the time-resolved TPA signals, we successfully developed a selective etching process using an etch-stopper structure consisting of 5-nm-thick AlAs and 200-nm-thick Al 0:3 Ga 0:7 As double layers for removing the GaAs substrate. An analysis of the observed TPA results reveals that the average light intensity of the multilayer cavity is 4… Show more

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Cited by 20 publications
(21 citation statements)
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“…Then, the (001) GaAs substrate was thinned down to ∼20 µm by mechanical polishing and the remaining substrate was completely removed by selective wet etching using a citric acid-based etchant. 38) Pairs of the top, middle, and bottom DBRs were 28, 12.5, and 34, respectively. Figure 1 shows the schematic of the current-injection surface-emitting device.…”
Section: Device Fabricationmentioning
confidence: 98%
“…Then, the (001) GaAs substrate was thinned down to ∼20 µm by mechanical polishing and the remaining substrate was completely removed by selective wet etching using a citric acid-based etchant. 38) Pairs of the top, middle, and bottom DBRs were 28, 12.5, and 34, respectively. Figure 1 shows the schematic of the current-injection surface-emitting device.…”
Section: Device Fabricationmentioning
confidence: 98%
“…The two epiwafers were directly bonded at room temperature using the conventional surface-activated bonding method [30], [31], which is commonly used for the integration of two dissimilar semiconductor materials. After the bonding, the (001) GaAs substrate was completely removed by mechanical polishing and selective wet etching using a citric acid-based etchant [32] for the optical measurements and device fabrication. Figure 3 shows a cross-sectional image of the waferbonded coupled multilayer cavity observed by scanning electron microscopy (SEM).…”
Section: Design and Fabricationmentioning
confidence: 99%
“…The remaining substrate was then completely removed by selective wet etching using a citric acid-based etchant. 28) Finally, the sample was dipped in a buffered hydrogen fluoride (BHF) solution to remove the oxide layer. Figure 3 shows the experimental setup for time-resolved FWM measurements using a femtosecond laser system with a 100 kHz repetition rate.…”
Section: Time-resolved Fwm Measurementsmentioning
confidence: 99%