Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition

Ishi, Daiki; Ezoe, Yuichiro; Ishikawa, Kumi; Numazawa, Masaki; Fukushima, Aoto; Otsubo, Ryota; Suzuki, Hikaru; Yuasa, Takae; Sakuda, Sae; Uchino, Tomoki; Fujitani, Morioki; Mitsuda, Kazuhisa; Sowa, Mark J.

doi:10.35848/1882-0786/aba7a5

Cited by 8 publications

(1 citation statement)

References 30 publications

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“…The required grasp of 10 cm2 deg2 at 0.6 keV is marginally satisfied with the Pt coated telescope, while it can be satisfied with large margin in the case of Co coating. Therefore, while smooth Pt atomic layer deposition coating has been established in the GEO-X team, 33 Co possibility is being pursued 34…”

Section: Geo-x Missionmentioning

confidence: 99%

GEOspace X-ray imager (GEO-X)

Ezoe,

Funase,

Nagata

et al. 2023

J. Astron. Telesc. Instrum. Syst.

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GEOspace X-ray imager (GEO-X) is a small satellite mission aiming at visualization of the Earth's magnetosphere by X-rays and revealing dynamic couplings between solar wind and the magnetosphere. In-situ spacecraft have revealed various phenomena in the magnetosphere. X-ray astronomy satellite observations recently discovered soft X-ray emissions originating from the magnetosphere. We are developing GEO-X by integrating innovative technologies of a wide field of view (FOV) X-ray instrument and a small satellite for deep space exploration. The satellite combines a Cubesat and a hybrid kick motor, which can produce a large delta v to increase the altitude of the orbit to about 30 to 60 R E from a relatively low-altitude (e.g., geo transfer orbit) piggyback launch. GEO-X carries a wide FOV (5 × 5 deg) and a good spatial resolution (10 arcmin) X-ray (0.3 to 2 keV) imaging spectrometer using a micro-machined X-ray telescope and a CMOS detector system combined with an optical blocking filter. We aim to launch the satellite around the solar maximum of solar cycle 25.

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Section: Geo-x Missionmentioning

confidence: 99%

GEOspace X-ray imager (GEO-X)

Ezoe,

Funase,

Nagata

et al. 2023

J. Astron. Telesc. Instrum. Syst.

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Study of Pt growth on Si, Al2O3, Au, and Ni surfaces by plasma enhanced atomic layer deposition

Yan

Zhang

Wang

et al. 2021

Journal of Applied Physics

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Atomic layer deposition is a powerful technique for achieving atomic-level control in the deposition of thin films and nanoparticles. The ultrathin noble metal films can be applied in many functional devices, but it is a challenge to obtain such films since the island growth mode generally happens instead of the layer growth mode. In this work, the nucleation and growth of platinum on Si, Al2O3, Au, and Ni substrates were studied using (MeCp)PtMe3 and O2 plasma as a precursor and a co-reactant, respectively. The evolution of Pt coverage on different surfaces was observed and discussed based on the experimental results by x-ray photoelectron spectra. The chemical adsorption of the precursor and the following processes like metal atom diffusion on substrate surfaces and up-stepping onto the existing metal islands were considered to dominate the growth before continuous films formed. The chemisorption determined the metal coverage on bare substrate surfaces, and the total coverage was influenced by metal atom diffusion and up-stepping behaviors that are determined by surface energy relationships between the deposited metal and substrate surfaces. Pt films were easier to form on Al2O3 and Ni surfaces compared with on Si and Au surfaces, respectively. A model was proposed to help to understand the mechanisms in the nucleation and growth processes, involving the chemisorption, diffusion, and up-stepping, which contributed to prepare ultrathin continuous Pt films on different substrates.

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Evaluating an electric field modulated plasma enhanced atomic layer deposition of platinum layers on different substrates

Yan,

Zhang,

Wang

et al. 2023

Journal of Applied Physics

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Atomic layer deposition is a key technique for preparing large area uniformity, three-dimensional conformal, and ultrathin films due to its sequential self-limiting saturated chemisorption properties. Electric fields of varying magnitudes and directions were applied on Si, Al2O3, Au, and Ni substrates in Pt plasma enhanced atomic layer deposition processes. Studying the influences of electric fields on the initial nucleation and growth of Pt films on different substrates helps to understand the dynamic knowledge and underlying physical mechanisms so as to obtain ultrathin, continuous films and full control over the morphology and distribution of deposited materials. The XPS results reveal that the Pt coverage rate increases on all substrates with applied voltages. The induced dipole moment causes the (MeCp)PtMe3 molecule to rotate in a certain direction resulting in a more compact arrangement, and the energy generated by electric fields also helps the dissociation of methyl, ethyl, Cp, and MeCp ligands, which greatly mitigate the spatial site resistance effect, thus improving initial monolayer chemisorption efficiency and the Pt coverage. We also find that Pt prefers to grow in the (111) direction due to the increase in adsorption of (MeCp)PtMe3 molecules caused by the gradient forces under electric fields. However, applied electric fields can also influence the morphology by inducing surface diffusion and acting on plasma species.

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Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition

Cited by 8 publications

References 30 publications

GEOspace X-ray imager (GEO-X)

GEOspace X-ray imager (GEO-X)

Study of Pt growth on Si, Al2O3, Au, and Ni surfaces by plasma enhanced atomic layer deposition

Evaluating an electric field modulated plasma enhanced atomic layer deposition of platinum layers on different substrates

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