2008
DOI: 10.1143/jjap.47.7047
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Enhancement of Dopant Activation in B-Implanted Diamond by High-Temperature Annealing

Abstract: In this paper, we present the effect of postimplantation high-temperature annealing at 1600 C on electrical properties and lattice structures of B-implanted diamonds. B multiple ion implantation at 30 -360 keV was performed to make a B boxprofile of 5 Â 10 18 or 5 Â 10 19 cm À3 into high-pressure, high-temperature type IIa diamond substrates at 400 C, followed by 1450 C and higher temperature annealing at 1600 C. Optical transmission spectra indicated that radiation damage was almost eliminated with an increas… Show more

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Cited by 19 publications
(10 citation statements)
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“…The atomic concentration ratio can be estimated from the peak area and the sensitivity factor of the atoms assigned from XPS (90, 91). Additionally, scanning tunneling microscopy (STM) (92), 11 B NMR (93, 94), secondary ion mass spectrometry (SIMS) (95), cathodoluminescence (9598), and chemiluminescence (82, 99, 100) are also used for characterization of BDD thin films.…”
Section: Characterization Of Bdd Thin Filmsmentioning
confidence: 99%
“…The atomic concentration ratio can be estimated from the peak area and the sensitivity factor of the atoms assigned from XPS (90, 91). Additionally, scanning tunneling microscopy (STM) (92), 11 B NMR (93, 94), secondary ion mass spectrometry (SIMS) (95), cathodoluminescence (9598), and chemiluminescence (82, 99, 100) are also used for characterization of BDD thin films.…”
Section: Characterization Of Bdd Thin Filmsmentioning
confidence: 99%
“…They obtained a relatively low doping efficiency of 9% for B-doped diamonds with 5 Â 10 19 cm À3 concentration. [17,18] Recently, we investigated the electrical activation of heavily implanted B atoms with doping a concentration of 3.5 Â 10 19 cm À3 in diamond focusing on the temperatures during the implantation and postannealing. [19,20] In the previous articles, the temperature in implantation was investigated in two extreme temperatures of room temperature (RT) and 900 °C, and that in activation annealing was done from 1150 to 1450 °C.…”
Section: Introductionmentioning
confidence: 99%
“…One such challenge is the local doping of impurity elements into diamond. [9][10][11][12][13][14][15][16][17] In the fabrication of electric devices, ion implantation is carried out as an impurity doping technique. When highenergy ions are implanted into a semiconductor, radiation damage, such as amorphization, can result.…”
Section: Introductionmentioning
confidence: 99%