Enhancement of Photoresist Removal Rate by Using Atomic Hydrogen Generated under Low-pressure Conditions

Yamamoto, Masashi; Umemoto, Hironobu; Ohdaira, Keisuke; Nagaoka, Shiro; Shikama, Tomokazu; Nishiyama, Takashi; Horibe, Hideo

doi:10.2494/photopolymer.28.303

Cited by 13 publications

(11 citation statements)

References 26 publications

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“…The experimental apparatus and the procedure were similar to those described elsewhere [12,[15][16][17]. The flow rate of hydrogen gas (≥99.99%; Air Liquide Japan Ltd.) was fixed at 100 sccm using a mass flow controller (SEC-400MK2; STEC Inc.).…”

Section: Methodsmentioning

confidence: 99%

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Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals

Yamamoto

Taki

Sunada

et al. 2018

J. Photopol. Sci. Technol.

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Photoresist removal method using hydrogen radicals, which are produced on a tungsten hot-wire catalyst, is effective to resolve some environmental and industrial problems in conventional methods for the fabrication of electronic devices. However, its removal rate is not as good as that of the conventional ones. We have previously described that the removal rate of a positive-tone novolac photoresist is enhanced by the addition of a small amount of oxygen gas to the atmosphere, in which hydrogen radicals are produced. Oxidizing radicals, such as OH and O radicals, can be produced together with H radicals. In present study, we examined the effects of oxygen addition on base polymers of KrF and ArF photoresists: the former is poly(vinyl phenol) (PVP), and the latter is poly(methyl methacrylate) (PMMA). Effects of oxygen addition on PVP was confirmed, as was found for the novolac photoresist. On the other hand, the effects on PMMA were different from the cases of the novolac photoresist and PVP. Results were ascribed to the presence or absence of benzene rings, the properties of polymers and the reactivity of oxidizing radicals.

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Section: Methodsmentioning

confidence: 99%

“…To alleviate the difficulties described above, we have studied removal methods using hydrogen radicals [7][8][9][10][11][12]. Hydrogen radicals are produced by decomposing molecular hydrogen on a metal hot-wire catalyst [13,14].…”

Section: Introductionmentioning

confidence: 99%

Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals

Yamamoto

Taki

Sunada

et al. 2018

J. Photopol. Sci. Technol.

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“…Some findings related to the use of H radicals generated on a tungsten hot-wire catalyst for the photoresist removal have already been reported [8][9][10][11][12][13]. In a previous study we achieved a best removal rate of 2.5 m/min using H radicals by heating up the catalyst and the substrate [10], but there are limitations.…”

Section: Introductionmentioning

confidence: 96%

“…The experimental apparatus and the procedure were similar to those described elsewhere [13,17,18]. A cylindrical vacuum chamber made of stainless steel was used.…”

Section: Experimental Methodsmentioning

confidence: 99%

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Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

Yamamoto¹,

Nagaoka²,

Umemoto³

et al. 2017

International Journal of Polymer Science

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We examined an environmentally friendly photoresist removal method using H radicals produced by decomposing hydrogen on a hot iridium catalyst. We examined the relationship between photoresist removal rate and its surface temperature using thin film interference and the removal properties using H radicals produced by the Ir catalyst. Decomposition behavior at polymer surface by radicals may be analyzed in further detail from the aspect of kinetics. Additionally, we investigated the oxygen addition effects on the removal rate. The photoresist removal rate increased with the oxygen additive amount and then decreased more gradually than in the case of using W filament. The increasing behavior was similar but there was a large difference between W and Ir catalyst in the decreasing behavior.

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Oxygen additive effects on decomposition rate of poly(vinyl phenol)-based polymers using hydrogen radicals produced by a tungsten hot-wire catalyst

et al. 2019

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Enhancement of Photoresist Removal Rate by Using Atomic Hydrogen Generated under Low-pressure Conditions

Cited by 13 publications

References 26 publications

Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals

Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals

Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

Oxygen additive effects on decomposition rate of poly(vinyl phenol)-based polymers using hydrogen radicals produced by a tungsten hot-wire catalyst

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