Enhancement of Removal Uniformity by Oxygen Addition for Photoresist Removal Using H Radicals Generated on a Tungsten Hot-Wire Catalyst

Yamamoto, Masashi; Maejima, Kazuma; Umemoto, Hironobu; Ohdaira, Keisuke; Shikama, Tomokazu; Nishiyama, Takashi; Horibe, Hideo

doi:10.2494/photopolymer.29.639

Cited by 10 publications

(4 citation statements)

References 10 publications

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“…Figure 5 shows the removal rate as a function of the oxygen additive amount using different filament materials. In this figure, the plots of W filament are our previous study [17,18]. The hydrogen flow rate was fixed at 100 sccm and the total pressure was 20 Pa.…”

Section: Resultsmentioning

confidence: 99%

“…The experimental apparatus and the procedure were similar to those described elsewhere [13,17,18]. A cylindrical vacuum chamber made of stainless steel was used.…”

Section: Experimental Methodsmentioning

confidence: 99%

“…The combination of H and other radicals is 2 International Journal of Polymer Science probably another effective choice for a breakthrough. We have examined the effects of oxygen addition under the presence of H radicals to produce OH radicals together with H radicals using the tungsten hot-wire catalyst [17,18].…”

Section: Introductionmentioning

confidence: 99%

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Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

Yamamoto¹,

Nagaoka²,

Umemoto³

et al. 2017

International Journal of Polymer Science

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We examined an environmentally friendly photoresist removal method using H radicals produced by decomposing hydrogen on a hot iridium catalyst. We examined the relationship between photoresist removal rate and its surface temperature using thin film interference and the removal properties using H radicals produced by the Ir catalyst. Decomposition behavior at polymer surface by radicals may be analyzed in further detail from the aspect of kinetics. Additionally, we investigated the oxygen addition effects on the removal rate. The photoresist removal rate increased with the oxygen additive amount and then decreased more gradually than in the case of using W filament. The increasing behavior was similar but there was a large difference between W and Ir catalyst in the decreasing behavior.

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Section: Resultsmentioning

confidence: 99%

“…The experimental apparatus and the procedure were similar to those described elsewhere [13,17,18]. A cylindrical vacuum chamber made of stainless steel was used.…”

Section: Experimental Methodsmentioning

confidence: 99%

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Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

Yamamoto¹,

Nagaoka²,

Umemoto³

et al. 2017

International Journal of Polymer Science

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“…The experimental apparatus and the procedure were similar to those described elsewhere [12,14,15]. In the stainless steel cylindrical chamber, the flow rate of hydrogen gas (≥99.99%; Air Liquide Japan Ltd.) was fixed at 100 sccm using a mass flow controller (SEC-400MK2; STEC Inc.).…”

Section: Methodsmentioning

confidence: 99%

Pressure Dependence of Photoresist Removal Rate Using Hydrogen Radicals

Yamamoto

Shiroi

Nagaoka

et al. 2017

J. Photopol. Sci. Technol.

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Photoresists play a key role in lithography processes for the fabrication of electronic devices, but must be removed after processing. The removal method using hydrogen radicals, which are produced on a tungsten hot-wire catalyst, is effective to resolve some environmental and industrial problems in usual methods. However, the removal rate is not as good as that of the usual methods. We have previously described that the removal rate is enhanced just by decreasing Hydrogen pressure but the rate limitations not clarified. In present study, we examined the removal rate dependence on the pressure and revealed that the upper limitation of the enhancement is achieved at 0.50 Pa. The removal rate at 0.50 Pa was 8.3 times higher than that at 20 Pa when the surface temperature was 250 °C.

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Radicals Generated in Cat‐CVDApparatus and Their Application

2019

Catalytic Chemical Vapor Deposition

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Enhancement of Removal Uniformity by Oxygen Addition for Photoresist Removal Using H Radicals Generated on a Tungsten Hot-Wire Catalyst

Cited by 10 publications

References 10 publications

Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

Pressure Dependence of Photoresist Removal Rate Using Hydrogen Radicals

Radicals Generated in Cat‐CVDApparatus and Their Application

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