As forward-looking electron devices increasingly adopt high-mobility, low-bandgap materials, such as germanium (Ge), questions remain regarding the feasibility of strain engineering in low-bandgap systems. Particularly, the Ge L-Γ valley separation (~150 meV) can be overcome by introducing a high degree of tensile strain (ε ≥ 1.5%). It is therefore essential to understand the nature of highly-strained Ge transport, wherein multi-valley electron conduction becomes a possibility. Here, we report on the competitiveness between L and Γ valley transport in highly tensile strained (ε ~ 1.6%) Ge/In 0.24 Ga 0.76 As heterostructures. Temperature-dependent magnetotransport analysis revealed two contributing carrier populations, identified as lower-and higher-mobility L and Γ valley electrons (in Ge) using temperature-dependent Boltzmann transport modeling. Coupling this interpretation with electron cyclotron resonance studies, the effective mass (m * ) of the higher-mobility Γ valley electrons was probed, revealing m * = (0.049 ± 0.007)m e . Moreover, comparison of the empirical and theoretical m * indicated that these electrons reside primarily in the first two quantum sublevels of the Ge Γ valley. Consequently, our results provide insight into the strain-dependent carrier dynamics of Ge, offering new pathways toward efficacious strain engineering.