2019
DOI: 10.1063/1.5117345
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Enhancement of the electronic thermoelectric properties of bulk strained silicon-germanium alloys using the scattering relaxation times from first-principles calculations

Abstract: We use first-principles electronic structure methods to calculate the electronic thermoelectric properties (i.e. due to electronic transport only) of single-crystalline bulk n-type silicon-germanium alloys vs Ge composition, temperature, doping concentration and strain. We find excellent agreement to available experiments for the resistivity, mobility and Seebeck coefficient. These results are combined with the experimental lattice thermal conductivity to calculate the thermoelectric figure of merit ZT , findi… Show more

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Cited by 12 publications
(9 citation statements)
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“…For electron transport, the conductivity tends to saturate for Si-rich alloys. This behavior has been found in many measurements of the electron Hall mobility of cubic Si 𝑥 Ge 1−𝑥 samples [60][61][62] and also in some calculations [56,63]. Due to disorder scattering in the random alloy, a minimum of the electrical conductivity near the middle of the composition range is expected.…”
Section: B Hexagonal Sige Alloyssupporting
confidence: 59%
See 1 more Smart Citation
“…For electron transport, the conductivity tends to saturate for Si-rich alloys. This behavior has been found in many measurements of the electron Hall mobility of cubic Si 𝑥 Ge 1−𝑥 samples [60][61][62] and also in some calculations [56,63]. Due to disorder scattering in the random alloy, a minimum of the electrical conductivity near the middle of the composition range is expected.…”
Section: B Hexagonal Sige Alloyssupporting
confidence: 59%
“…For example, for cub-Ge, values of about −330 µV K −1 have been measured under normal conditions (𝜌 = 10 14 cm −3 ) [55]. Ab-initio calculations of 𝑛-doped cub-Ge gave values close to −270 µV K −1 (𝜌 = 1.1•10 19 cm −3 ) [56]. Calculations on 𝑛-doped Si nanosheets yielded values in the range of −300 to −500 µV K −1 (depending on the surface) with a similar range close to 300 to 500 µV K −1 for 𝑝-doped Si (both with 𝜌 = 1.1 • 10 19 cm −3 and 𝑇 = 300 K) [57].…”
Section: Seebeck Coefficientmentioning
confidence: 99%
“…To date, Seebeck coefficients of Ge structures, and in particular Ge NWs, have not abounded in the literature. The Ge Seebeck coefficient has been evaluated at room temperature in the −600 to −1000 µV/K range [ 44 , 45 , 46 ] for bulk Ge for a low doping concentration and −400 µV/K for Ge thin films [ 46 ] but no value could be found for Ge NWs.…”
Section: Resultsmentioning
confidence: 99%
“…[20,36] for strained Ge and SiGe. The effects of ionized impurity scattering are included using the Brooks-Herring approach [37][38][39][40]. To ease integration of the transport properties across the Brillouin zone at different strain conditions, we used the first-principles-based k•p analytic form of the electronic band structure of ε-Ge after Rideau et al [17].…”
Section: Calculation Of the Ge Electronic Transport Properties Under ...mentioning
confidence: 99%