The fabrication process for the uniform large-scale MoS2, WS2 transition-metal dichalcogenides (TMDCs)
monolayers,
and their heterostructures has been developed by van der Waals epitaxy
(VdWE) through the reaction of MoCl5 or WCl6 precursors and the reactive gas H2S to form MoS2 or WS2 monolayers, respectively. The heterostructures
of MoS2/WS2 or WS2/MoS2 can be easily achieved by changing the precursor from WCl6 to MoCl5 once the WS2 monolayer has been fabricated
or switching the precursor from MoCl5 to WCl6 after the MoS2 monolayer has been deposited on the substrate.
These VdWE-grown MoS2, WS2 monolayers, and their
heterostructures have been successfully deposited on Si wafers with
300 nm SiO2 coating (300 nm SiO2/Si), quartz
glass, fused silica, and sapphire substrates using the protocol that
we have developed. We have characterized these TMDCs materials with
a range of tools/techniques including scanning electron microscopy
(SEM), X-ray photoelectron spectroscopy (XPS), micro-Raman analysis,
photoluminescence (PL), atomic force microscopy (AFM), transmission
electron microscopy (TEM), energy-dispersive X-ray spectroscopy (EDX),
and selected-area electron diffraction (SAED). The band alignment
and large-scale uniformity of MoS2/WS2 heterostructures
have also been evaluated with PL spectroscopy. This process and resulting
large-scale MoS2, WS2 monolayers, and their
heterostructures have demonstrated promising solutions for the applications
in next-generation nanoelectronics, nanophotonics, and quantum technology.