2020
DOI: 10.1016/j.carbon.2019.10.016
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Enhancing the magnetism of 2D carbide MXene Ti3C2Tx by H2 annealing

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Cited by 63 publications
(38 citation statements)
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“…68 Zhang et al have reported the paramagnetic nature of as-prepared Ti 3 C 2 and its magnetic variation on different synthesis conditions. 69 Akgenc et al theoretically pointed out the ferromagnetic half-metal and antiferromagnetic semiconductor nature of Ti 2 C MXene. 70 Since the magnetic behavior of 2D nanostructures could be intrinsic or defectinduced, the wet chemical etching route could produce 2D sheets with intrinsic magnetic properties with high-yield and lowcost mass production.…”
Section: Resultsmentioning
confidence: 99%
“…68 Zhang et al have reported the paramagnetic nature of as-prepared Ti 3 C 2 and its magnetic variation on different synthesis conditions. 69 Akgenc et al theoretically pointed out the ferromagnetic half-metal and antiferromagnetic semiconductor nature of Ti 2 C MXene. 70 Since the magnetic behavior of 2D nanostructures could be intrinsic or defectinduced, the wet chemical etching route could produce 2D sheets with intrinsic magnetic properties with high-yield and lowcost mass production.…”
Section: Resultsmentioning
confidence: 99%
“…It is suggested that the defects formation process in MXenes respond quite differently than other 2D lightweight material due to its complex structure. 84 . The Ti 3 C 2 T x showed the very weak paramagnetism while H 2 annealing improve the saturation magnetization even-though ferromagnetism was observed after annealing at 500 o C as shown in Figure 5 (a-d).…”
Section: Defects Tuned Magnetismmentioning
confidence: 99%
“…Recently, Tang and co‐workers reported the research of saturation magnetization enhancement of Ti 3 C 2 T x via Ti–C vacancy production under annealing in H 2 . [ 53 ] It was found that oxygen content in Ti 3 C 2 T x remained the same level after annealing in H 2 under 100 to 500 °C, but the functional groups trended to transform from CTiOH to CTiO and OTiO. Most importantly, there were Ti and C vacancy together with TiC vacancy formed during the annealing process (Figure 4b‐i).…”
Section: Surface Controlling and Interlayer Engineeringmentioning
confidence: 98%
“…Reproduced with permission. [ 53 ] Copyright 2019, Elsevier. c) Li + storage capacity of V 2 CT x influenced by F and OH, i) side view of V 2 CLi 6 , ii) top view of V 2 CLi 6 , iii) I‐V 2 CF 2 Li, and iv) I‐V 2 C(OH) 2 Li 1.5 ; “I” stands for the type of F or OH groups are located above the hollow sites formed by three neighboring C atoms on both sides of V 2 C monolayer.…”
Section: Surface Controlling and Interlayer Engineeringmentioning
confidence: 99%