Liquid
interfacial self-assembled two-dimensional nanomonolayers
are promising as colloidal crystal templates or lithographic masks
for the mass production of periodic nanoarrays. However, the interfacial
self-assembled monolayers usually suffer various defects such as grain
boundaries, line defects, vacancy defects, and multilayers due to
imperfect process technology. Here, we demonstrated a series of optimized
strategies including the hemispherical-depression-assisted self-assembly,
dot coating approach, and vertical lifting transfer protocol to eliminate
surface defects especially multilayers jointly. After stabilizing
the hemispherical depression height to 1.5 mm with a 40° tilted
silicon slide, the self-assembly time was significantly shortened
to 10 min for a 1 × 2 cm2 area of PS monolayer. The
series of strategies were successfully implemented not only on glass
and silicon flat substrates but also on the side and end face of optical
fiber, even on flexible substrates, while maintaining great morphologies.
Besides, in association with nanospherical lens photolithography and
nanosphere lithography technologies, various two-dimensional nanoarrays
such as nanotriangles and nanoholes could be successfully obtained
for subsequent optical properties research, which present broad application
prospects in biochemical sensing, medicine, environmental protection,
and other fields.