“…It allows the fabrication of tailored coatings with regard to mechanical and chemical properties and, at the same time, enables low coating thicknesses in the nanometer range. The formation of organosilica layers by PECVD utilizing hexamethyldisiloxane (HMDSO) as a precursor results in membranes with gas separation characteristics [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 ]. Inorganic [ 24 , 25 , 26 , 27 ] or organic substrate membranes [ 15 , 21 , 22 , 23 , 28 , 29 , 30 , 31 , 32 , 33 ] function as support for the thin organosilica layer.…”