2019
DOI: 10.1016/j.apsusc.2018.10.133
|View full text |Cite
|
Sign up to set email alerts
|

Environment friendly chemical mechanical polishing of copper

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
5

Citation Types

1
55
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
8
2

Relationship

1
9

Authors

Journals

citations
Cited by 250 publications
(56 citation statements)
references
References 45 publications
1
55
0
Order By: Relevance
“…In recent years, sustainable development has become a typically discussed theme worldwide and has increasingly attracted people's attention toward protecting the environment and energy saving, resulting in numerous advanced techniques being exploited. For example, novel environmentally friendly slurries have been developed and used widely in the semiconductor, microelectronics, and optoelectronics industries, consequently reducing pollution induced by traditional manufacturing and industries significantly [1][2][3][4]. Recently, nontoxic and eco-friendly carbon-based materials including fullerene, carbon nanotubes, graphene, onion-like carbon, nano-graphite, and nanodiamond have become research hotspots in material and chemical sciences.…”
Section: Introductionmentioning
confidence: 99%
“…In recent years, sustainable development has become a typically discussed theme worldwide and has increasingly attracted people's attention toward protecting the environment and energy saving, resulting in numerous advanced techniques being exploited. For example, novel environmentally friendly slurries have been developed and used widely in the semiconductor, microelectronics, and optoelectronics industries, consequently reducing pollution induced by traditional manufacturing and industries significantly [1][2][3][4]. Recently, nontoxic and eco-friendly carbon-based materials including fullerene, carbon nanotubes, graphene, onion-like carbon, nano-graphite, and nanodiamond have become research hotspots in material and chemical sciences.…”
Section: Introductionmentioning
confidence: 99%
“…However, the polishing effect of optimizing experimental parameters in the CMP process is limited [10][11][12][13]. Therefore, the development of a novel polishing slurry is desirable for improving the accuracy and efficiency of CMP [14][15][16][17][18][19]. As one of these components, abrasives are critical for removing the corrosion layer by mechanical grinding in a typical CMP process.…”
Section: Introductionmentioning
confidence: 99%
“…As an example, nanomaterials can be used to protect the environment during conventional machining and manufacturing processes that generate pollution due to the use of toxic and corrosive slurries. This is undertaken by employing nanomaterials to develop novel environmental-friendly chemical and mechanical polishing slurries (Zhang et al 2012a(Zhang et al , b, 2013(Zhang et al , 2015a(Zhang et al , b, 2018(Zhang et al , 2019(Zhang et al , 2020aWang et al 2018). The use of improved procedures and enhanced slurries enables the fabrication of high-performance devices in semiconductor and microelectronics industries (Zhang et al 2017a;Qumar et al 2020;Raza et al 2019;Ikram et al 2020b).…”
Section: Introductionmentioning
confidence: 99%