“…16,17,25,39 As a result, Al has become the best choice for UV applications, and it is also suitable for the visible range with excellent performance. 16,41 In addition, Al remains very stable in the ambient environment due to the formation of surface native oxide (Al 2 O 3 ) with a thickness of 3−5 nm, 39 and it has been widely used as a plasmonic material for UV plasmonic lasers, 50,51 deep UV resonance, 17,52 UV photodetector, 25 surface-enhanced Raman spectroscopy, 16,17,53 and various visible-light applications, including CMOS-compatible color filters, 27−30 photocatalyst, 54 and nonlinear plasmonics. 55 Cu, however, is also a CMOS-compatible plasmonic material, widely used in microelectronic devices owing to its high electrical conductivity and natural abundance, and it can offer good plasmonic performance.…”