Epitaxial and non-epitaxial platinum, palladium and silver films on yttrium-stabilised zirconia

Beck, G.; Bachmann, Christoph; Bretzler, Rita; Kmeth, Ralf

doi:10.1016/j.matchemphys.2015.03.045

Cited by 5 publications

(10 citation statements)

References 26 publications

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“…Several metallic films (i.e., Ag, Pt) were synthesized on insulator substrates like mica, sapphire, yttria-stabilized zirconia YSZ, − SrTiO 3 and MgO by pulsed laser deposition (PLD). The goal is to grow and to characterize the quality of metal films used as bottom electrodes under similar conditions to those used for the oxide layer.…”

Section: Introductionmentioning

confidence: 99%

“…The goal is to grow and to characterize the quality of metal films used as bottom electrodes under similar conditions to those used for the oxide layer. The morphology evolution during the PLD growth of metal films on insulators has mainly been investigated by such microscopic methods like scanning electron microscopy (SEM) and atomic force microscopy (AFM). − These latter are also important tools to study the crystal nucleation and growth. In the most recent reports, the dependency of the nucleation and of the growth mechanisms on the substrate and temperature have been investigated at atomic scale using in situ transmission electron microscopy (TEM). − Most metals do not wet insulating substrates.…”

Section: Introductionmentioning

confidence: 99%

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Time-Resolved Morphology and Kinetic Studies of Pulsed Laser Deposition-Grown Pt Layers on Sapphire at Different Growth Temperatures by in Situ Grazing Incidence Small-Angle X-ray Scattering

et al. 2021

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Optimizing and monitoring the growth conditions of Pt films, often used as bottom electrodes in multiferroic material systems, represents a highly relevant issue that is of importance for controlling the crystalline quality and performance of ferroelectric oxides such as, e.g. LuFeO 3 . We performed a time-resolved monitoring of the growth and morphology of Pt films during pulsed laser deposition (PLD) in dependence on the grown film effective thickness and on the growth temperature Tg using in situ grazing incidence small-angle X-ray scattering (GISAXS). Through real-time analysis and modeling of GISAXS patterns, we could fully characterize the influence of Tg on the morphology and on the growth kinetics of the Pt layers. Consequently, critical and characteristic effective thicknesses for the transitions nucleation phase (I)/coalescence phase (II) and coalescence phase (II)/coarsening phase (III) could be determined. In combination with complementary microscopic imaging and chemical mapping via combined SEM/EDXS, we demonstrate the occurrence of a morphological progression in the Pt PLD-grown Pt films, changing from grains at room temperature to a 3D-island morphology at 300 °C, further to a hole-free structure at 500 °C, and finally to a channel structure for 700 and 900 °C. The film topography, as characterized by atomic force microscopy (AFM), favors the PLD growth of Pt layers at temperatures beyond 700 °C where the film is homogeneous, continuous, and hole-free with a flat and smooth surface. The double dependency of the percolation transition on the film effective thickness and on the growth temperature has been established by measuring the electrical conductivity.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Time-Resolved Morphology and Kinetic Studies of Pulsed Laser Deposition-Grown Pt Layers on Sapphire at Different Growth Temperatures by in Situ Grazing Incidence Small-Angle X-ray Scattering

et al. 2021

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“…More efficient use of platinum thin films means a reduction of the quantity of the material in an application, but still, ensuring the same function of the application. For this reason, the substitution of this metal in its applications would be useful, but because of its famous properties, this is very difficult [13]. One of the solutions is to develop new materials with different content of platinum to improve the properties of thin films [14].…”

Section: Of 13mentioning

confidence: 99%

Characterization of Platinum-Based Thin Films Deposited by Thermionic Vacuum Arc (TVA) Method

et al. 2020

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The current work aimed to characterize the morphology, chemical, and mechanical properties of Pt and PtTi thin films deposited via thermionic vacuum arc (TVA) method on glass and silicon substrates. The deposited thin films were characterized by means of a scanning electron microscope technique (SEM). The quantitative elemental microanalysis was done using energy-dispersive X-ray spectroscopy (EDS). The tribological properties were studied by a ball-on-disc tribometer, and the mechanical properties were measured using nanoindentation tests. The roughness, as well as the micro and nanoscale features, were characterized using atomic force microscopy (AFM) and transmission electron microscopy (TEM). The wettability of the deposited Pt and PtTi thin films was investigated by the surface free energy evaluation (SFE) method. The purpose of our study was to prove the potential applications of Pt-based thin films in fields, such as nanoelectronics, fuel cells, medicine, and materials science.

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“…P latinum is one of the metals that exhibit excellent physicochemical properties such as a high melting point, resistance to corrosion, and catalytic activity, as well as thermal and electrical conductivities. 1) However, its limited application due to its high price has prompted research regarding its recycling and the use of alternative materials. Considerations of catalysis at the surface or an electrode system suggest the possibility of using a thin film instead of a bulk material in order to reduce the amount of platinum required for an application.…”

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confidence: 99%

“…2,3) In spite of relatively large lattice mismatch (ca. −23%), platinum has been grown epitaxially on yttria-stabilized zirconia (YSZ), and thin films of platinum have been deposited by pulse laser deposition (PLD) 1,2,[4][5][6][7][8][9][10][11] or sputtering. 12) It should be noted that Pt=YSZ is an important model system for solid fuel cells.…”

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confidence: 99%

Single-crystalline epitaxial platinum film on yttrium-stabilized zirconia (111) prepared by sputtering deposition

Tanaka

Taniguchi

2016

Jpn. J. Appl. Phys.

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Sputtering is an important film deposition method that has been used for the fabrication of thin films used in basic research to the mass production process in factories. However, single-crystalline epitaxial platinum film has not been successfully prepared on yttria-stabilized zirconia (YSZ) (111) substrates by the sputtering method. We have deposited platinum by inductively coupled plasma-assisted sputtering on YSZ(111) with postdeposition annealing at 750–850 °C. As a result, single-crystalline epitaxial films with a root mean square roughness better than 0.2 nm were successfully fabricated.

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Epitaxial and non-epitaxial platinum, palladium and silver films on yttrium-stabilised zirconia

Cited by 5 publications

References 26 publications

Time-Resolved Morphology and Kinetic Studies of Pulsed Laser Deposition-Grown Pt Layers on Sapphire at Different Growth Temperatures by in Situ Grazing Incidence Small-Angle X-ray Scattering

Time-Resolved Morphology and Kinetic Studies of Pulsed Laser Deposition-Grown Pt Layers on Sapphire at Different Growth Temperatures by in Situ Grazing Incidence Small-Angle X-ray Scattering

Characterization of Platinum-Based Thin Films Deposited by Thermionic Vacuum Arc (TVA) Method

Single-crystalline epitaxial platinum film on yttrium-stabilized zirconia (111) prepared by sputtering deposition

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