Springer Handbook of Electronic and Photonic Materials 2006
DOI: 10.1007/978-0-387-29185-7_14
|View full text |Cite
|
Sign up to set email alerts
|

Epitaxial Crystal Growth: Methods and Materials

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
17
0

Year Published

2015
2015
2022
2022

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 16 publications
(17 citation statements)
references
References 109 publications
0
17
0
Order By: Relevance
“…Here, b In (β) is a β-dependent adsorption coefficient on the droplet surface for In similar to the one in Equation 2for Sb, and Ω InSb = 0.0680 nm 3 is the elementary volume of InSb pair in ZB InSb [36]. Since the droplet contains only In atoms, we can write the corresponding change in the droplet volume, which equals Ω In N In (where Ω In = 0.0261 nm 3 is the elementary volume of liquid In) [36]. At a fixed R, we can present the volume change solely through dβ according to dN In /dt = (πR 3 /Ω In )(1 + cosβ) −2 (dβ/dt) 2 [41].…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Here, b In (β) is a β-dependent adsorption coefficient on the droplet surface for In similar to the one in Equation 2for Sb, and Ω InSb = 0.0680 nm 3 is the elementary volume of InSb pair in ZB InSb [36]. Since the droplet contains only In atoms, we can write the corresponding change in the droplet volume, which equals Ω In N In (where Ω In = 0.0261 nm 3 is the elementary volume of liquid In) [36]. At a fixed R, we can present the volume change solely through dβ according to dN In /dt = (πR 3 /Ω In )(1 + cosβ) −2 (dβ/dt) 2 [41].…”
Section: Resultsmentioning
confidence: 99%
“…InSb has the smallest band gap, the highest electron mobility and the largest thermo-power figure of merit among the entire family of III-V semiconductor compounds [1,2], which makes this material ideal for various applications in high speed electronics and photonics. Unfortunately, however, epitaxial growth of InSb in the form of two-dimensional layers is challenging due to its large lattice mismatch with common semiconductor substrates [3,4]. There have been many efforts to grow InSb in the form of nanowires (NWs) on both on InSb substrates [5] and on lattice-mismatched substrates such as Si and InAs [6][7][8][9][10][11][12][13], which enables a radical improvement of its crystalline quality and may pave new ways to fabricate InSb-based devices.…”
Section: Introductionmentioning
confidence: 99%
“…This typically requires careful polishing to ensure that the active layer is sufficiently flat and thin. Epitaxial growth processes [8], such as liquid phase epitaxy (LPE) [9], pulsed laser deposition [10], molecular beam epitaxy (MBE) [11], hydrothermal epitaxy [12], metal oxide chemical vapor deposition (MOCVD) [13], and halide vapor phase epitaxy (HVPE) [14], enable the production of high-quality crystalline materials, which are practical for waveguide fabrication.…”
Section: Introductionmentioning
confidence: 99%
“…The thickness of the waveguide structure can be controlled accurately by the growth duration and growth temperature. Finally, liquid phase epitaxy is adaptable for any single crystalline layer or active dopant, using an appropriate flux system and growth conditions [8].…”
Section: Introductionmentioning
confidence: 99%
“…For instance, metals can epitaxially grow on metal oxides through atomic layer deposition [15], pulsed laser deposition [17], UHV sputtering deposition [18][19][20][21], and annealing [22]. Unfortunately, vapor-phase deposition techniques suffer from several disadvantages, such as the requirement of ultra-high vacuum conditions and the use of special equipment [23]. Furthermore, most of the vapor-phase deposition techniques only work for planar surfaces and cannot be applied to deposit metal/alloy nanoparticles onto high-surface-area supports.…”
Section: Introductionmentioning
confidence: 99%