Epitaxial Electrodeposition of High-Aspect-Ratio Cu<sub>2</sub>O(110) Nanostructures on InP(111)

Liu, Run; Kulp, Elizabeth A.; Oba, Fumiyasu; Bohannan, Eric W.; Ernst, F.; Switzer, Jay A.

doi:10.1021/cm048296l

Cited by 79 publications

(38 citation statements)

References 28 publications

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“…Oxides of copper have been investigated for decades due to their unique semiconductor and optical properties [13][14][15][16]. Few studies have reported that copper nanoparticles exhibit excellent bactericidal properties [17][18][19][20].…”

Section: Introductionmentioning

confidence: 99%

Microwave synthesis of copper oxide nanoparticles using tea leaf and coffee powder extracts and its antibacterial activity

2014

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Oxides of copper have been investigated for decades due to their unique semiconductor and optical properties. The review of literature revealed that very few reports are available on the synthesis of copper oxide nanoparticles using microorganisms and plant extracts. In this paper, we have reported the synthesis of copper oxide nanoparticles (CuO) using tea leaf and coffee powder extracts under microwave irradiations. The synthesis was carried out by irradiating metal salt and the extracts of tea and coffee in 1:3 ratio in a microwave at 540 W for 7-8 min. The synthesized nanoparticles were characterized by Scanning electron microscope, X-ray diffraction, UVvisible spectroscopy and Fourier transform infrared spectroscopy. The antibacterial activity of these nanoparticles was tested against six human pathogenic microbes. It was interesting to find that these nanoparticles possess remarkable antibacterial activity against two human pathogenic bacteria. Moreover, the use of environmentally benign materials for the synthesis of CuO nanoparticles offers numerous benefits of eco-friendliness and compatibility for pharmaceutical and other biomedical applications.

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Section: Introductionmentioning

confidence: 99%

Microwave synthesis of copper oxide nanoparticles using tea leaf and coffee powder extracts and its antibacterial activity

2014

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“…Cuprous oxide (Cu 2 O) is a p-type semiconductor that has attracted much current interest because of its potential applications in solar energy cell [6,7], photoelectrochemical cells [8,9], catalysis [10,11] and gas sensors [12]. In recent years, cathodic electrodeposition of Cu 2 O thin films onto various substrates has been studied by several authors [13][14][15][16][17][18][19][20] because of electrodeposition in solution presenting a costeffective method for preparation of large area thin films. It has been revealed that the growth conditions affected the physical properties of the films.…”

Section: Introductionmentioning

confidence: 99%

Morphological control of Cu2O micro-nanostructure film by electrodeposition

Sun

Guo

Song

et al. 2007

Journal of Crystal Growth

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“…As a p-type semiconductor (direct bandgap ∼ 2.17 eV) with unique optical and magnetic properties, cuprous oxide (Cu 2 O) is a promising material with potential applications in solar energy conversion, micro-/nanoelectronics, magnetic storage devices, catalysis, and biosensing. [21][22][23] Moreover, Cu 2 O crystals have been at the center of research on the Bose-Einstein condensation of excitons. [24] Many recent efforts have been devoted to the shape-controlled synthesis of Cu 2 O micro-and nanocrystals.…”

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One‐Pot Synthesis of Octahedral Cu₂O Nanocages via a Catalytic Solution Route

et al. 2005

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lithography process, using the increase in the T g of the photoresist particles caused by UV-induced crosslinking. Subsequent deposition of silica through the patterned-colloidal mask yielded ordered domains of nanoscale-hole arrays on a micrometer length scale. The present technique produces a spatially organized mask with multiple length scales for colloidal lithography. As such, various functional materials can be deposited through these multiscale colloidal masks, fabricating nanopatterned substrates, which are of practical significance in a wide range of applications from biosensors to optoelectronic devices. ExperimentalSynthesis of Photoresist Particles: MMA (Aldrich, > 99 %) and GMA (Aldrich, > 95 %) were used as supplied. Potassium persulfate (KPS) was used as an initiator for emulsion polymerization. A 100 mL two-necked round-bottom flask was filled with KPS dissolved in 50 mL of distilled water, and a monomer mixture of MMA and GMA. The content of KPS was fixed at 1 wt.-%. The content of GMA was varied in the range 5-30 wt.-% of the total monomer content, which was fixed at 10 wt.-%. The system was kept under a nitrogen atmosphere and the reaction mixture was stirred magnetically at 300 rpm. When the KPS was dissolved completely, the mixture was heated to 75°C using an oil bath. After 12 h, the mixture was separated by centrifugation and was purified with distilled water several times. The size of the particles, measured by SEM, ranged from 360 to 420 nm. Later, the cationic photoinitiator, Irgacure 250, was introduced to the photoresist particles by spin-coating.Measurement of T g : The glass-transition temperatures of the UV-exposed and UV-screened poly(MMA-co-GMA) particles were determined using a differential scanning calorimeter (DSC, TA Instruments, Q1000) under a nitrogen atmosphere at a heating rate of 10°C min -1 . To measure the T g of UV-exposed particles, the particles were fully baked at 150°C for 2 h after UV exposure, because the crosslinking reaction could proceed during the DSC measurement. Therefore, the measured T g could be higher than the T g of the UV-exposed particles in the patterning. Meanwhile, T g of the UV-screened particles was compared with that estimated using the rule-of-mixtures theory where T g = 115°C for polyMMA and T g = 75°C for polyGMA [19].Deposition of Silica: Silica was deposited in a batch reactor under atmospheric pressure at room temperature. The sample was sequentially exposed to water vapor for 30 min, dried in argon gas for purging the reactor, and then SiCl 4 vapor for 20 min. The reactant vapors were carried by argon gas under atmospheric pressure. The concentration of SiCl 4 was 0.05 vol.-% in moisture-free argon gas and the relative humidity of water vapor was 50 %. (Caution: silicon tetrachloride is a very corrosive liquid. Use it only with adequate ventilation, and wear protective clothing and safety goggles.) The thickness of the silica layer was controlled by the exposure time to the precursor vapor and around 50 nm for 30 min exposure was obtained.

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Epitaxial Electrodeposition of High-Aspect-Ratio Cu₂O(110) Nanostructures on InP(111)

Cited by 79 publications

References 28 publications

Microwave synthesis of copper oxide nanoparticles using tea leaf and coffee powder extracts and its antibacterial activity

Microwave synthesis of copper oxide nanoparticles using tea leaf and coffee powder extracts and its antibacterial activity

Morphological control of Cu2O micro-nanostructure film by electrodeposition

One‐Pot Synthesis of Octahedral Cu₂O Nanocages via a Catalytic Solution Route

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Epitaxial Electrodeposition of High-Aspect-Ratio Cu2O(110) Nanostructures on InP(111)

Cited by 79 publications

References 28 publications

Microwave synthesis of copper oxide nanoparticles using tea leaf and coffee powder extracts and its antibacterial activity

Microwave synthesis of copper oxide nanoparticles using tea leaf and coffee powder extracts and its antibacterial activity

Morphological control of Cu2O micro-nanostructure film by electrodeposition

One‐Pot Synthesis of Octahedral Cu2O Nanocages via a Catalytic Solution Route

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Epitaxial Electrodeposition of High-Aspect-Ratio Cu₂O(110) Nanostructures on InP(111)

One‐Pot Synthesis of Octahedral Cu₂O Nanocages via a Catalytic Solution Route